dimethylaluminum hydride
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Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200 °C

2020 ◽  
Vol 53 (16) ◽  
pp. 165103
Author(s):  
Dianne C Corsino ◽  
Juan Paolo S Bermundo ◽  
Mami N Fujii ◽  
Kiyoshi Takahashi ◽  
Yasuaki Ishikawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Atomic Layer ◽  
Bias Stress ◽  
Amorphous Ingazno ◽  
Dimethylaluminum Hydride

Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors

2018 ◽  
Vol 11 (6) ◽  
pp. 061103 ◽  
Author(s):  
Dianne C. Corsino ◽  
Juan Paolo S. Bermundo ◽  
Mami N. Fujii ◽  
Kiyoshi Takahashi ◽  
Yasuaki Ishikawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Thin Film Transistors ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Amorphous Ingazno ◽  
Dimethylaluminum Hydride

ChemInform Abstract: Preparative Synthesis of Dimethylaluminum Hydride.

ChemInform ◽  
2010 ◽  
Vol 27 (49) ◽  
pp. no-no
Author(s):  
N. N. GOVOROV ◽  
P. A. STOROZHENKO ◽  
N. N. KORNEEV
Keyword(s):  
Preparative Synthesis ◽  
Dimethylaluminum Hydride

C4H14Al2 Dimethylaluminum hydride dimer

2005 ◽  
pp. 1-1
Author(s):  
G. Graner ◽  
E. Hirota ◽  
T. Iijima ◽  
K. Kuchitsu ◽  
D. A. Ramsay ◽  
...  
Keyword(s):  
Dimethylaluminum Hydride

Thermal Decomposition Pathways and Rates for Dimethylaluminum Hydride

2001 ◽  
Vol 105 (21) ◽  
pp. 5260-5265 ◽  
Author(s):  
Stephen P. Walch ◽  
Christopher E. Dateo
Keyword(s):  
Thermal Decomposition ◽  
Dimethylaluminum Hydride
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