Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers

2014 ◽  
Vol 118 (31) ◽  
pp. 17549-17555 ◽  
Author(s):  
Jan Čechal ◽  
Josef Polčák ◽  
Tomáš Šikola
Keyword(s):  
Oxide Layers ◽  
Gold Diffusion ◽  
Ultrathin Oxide ◽  
Kinetics Of

Atomically Smooth Ultrathin Oxide Layers on SI(113)

1999 ◽  
Vol 567 ◽  
Author(s):  
H.-J. Müssig ◽  
J. Dabrowski ◽  
S. Hinrich
Keyword(s):  
Elevated Temperatures ◽  
Oxidation Mechanism ◽  
Dissociative Chemisorption ◽  
Initial Oxidation ◽  
Precursor State ◽  
Oxide Layers ◽  
Adsorption Sites ◽  
Molecular Precursor ◽  
Diffusion Paths ◽  
Ultrathin Oxide

ABSTRACTWe report the first direct observation of dissociative chemisorption of oxygen molecules on a silicon surface at room temperature via a molecular precursor state. We link this to the fact that smooth oxide layers can be grown easily on Si(113). The process of initial oxidation is discussed in terms of surface diffusion paths and surface stress. First ab initiocalculations help elucidate the favored adsorption sites and the oxidation mechanism. Experimental evidence was found for bond geometries resulting in the quasi-epitaxial growth of a chemisorption layer on the substrate at elevated temperatures (600°C). In contrast to the first stages of Si(001) oxidation, neither defects nor the ejection of Si atoms plays a significant role during the initial oxidation of Si(113).

Photoconductivity of Macroporous and Nonporous Silicon with Ultrathin Oxide Layers

2018 ◽  
Vol 47 (9) ◽  
pp. 5105-5108 ◽  
Author(s):  
K. P. Konin ◽  
Yu. V. Goltvyansky ◽  
L. A. Karachevtseva ◽  
M. I. Karas ◽  
D. V. Morozovs’ka
Keyword(s):  
Oxide Layers ◽  
Ultrathin Oxide

Structure of ultrathin oxide layers on metal surfaces from grazing scattering of fast atoms

2009 ◽  
Vol 256 (2) ◽  
pp. 365-370 ◽  
Author(s):  
H. Winter ◽  
J. Seifert ◽  
D. Blauth ◽  
M. Busch ◽  
A. Schüller ◽  
...  
Keyword(s):  
Metal Surfaces ◽  
Oxide Layers ◽  
Grazing Scattering ◽  
Ultrathin Oxide

X-Ray Diffraction Analysis of Oxide Layers of Zr-Based Alloys

2007 ◽  
Vol 567-568 ◽  
pp. 237-240
Author(s):  
Galina Gosmanová ◽  
Ivo Kraus ◽  
Michal Kolega ◽  
Věra Vrtílková
Keyword(s):  
Residual Stresses ◽  
Diffraction Analysis ◽  
X Ray Diffraction ◽  
Transient Conditions ◽  
Oxide Layers ◽  
X Ray ◽  
Corrosion Kinetics ◽  
Short Time ◽  
Kinetics Of ◽  
Tubular Specimens

The results of X-ray diffraction analysis of macroscopic stresses σ and crystallite size D in oxide layers are presented in this contribution. The oxide layers were formed on tubular specimens of Zircaloy 4 and Zr1Nb alloys which were simultaneously oxidized for various times under temperature transient conditions (oxidation in water at 360 °C with a short-time shock in steam at 500 °C). A qualitative relation was outlined between the residual stresses in oxide layers and corrosion kinetics of the alloys under investigation.

X-ray photoelectron spectroscopy study of ultrathin oxide layers on Al and Si substrates

1993 ◽  
Vol 226 (2) ◽  
pp. 219-223 ◽  
Author(s):  
T.J. Šarapatka
Keyword(s):  
Photoelectron Spectroscopy ◽  
Spectroscopy Study ◽  
Oxide Layers ◽  
X Ray ◽  
Si Substrates ◽  
Ultrathin Oxide

Void formation during thermal decomposition of ultrathin oxide layers on the Si(110) surface

1998 ◽  
Vol 398 (1-2) ◽  
pp. 134-142 ◽  
Author(s):  
Ken Fujita ◽  
Heiji Watanabe ◽  
Masakazu Ichikawa
Keyword(s):  
Thermal Decomposition ◽  
Void Formation ◽  
Oxide Layers ◽  
Ultrathin Oxide

Kinetics of electrochemical lithium intercalation into thin tungsten (VI) oxide layers

2008 ◽  
Vol 44 (5) ◽  
pp. 530-542 ◽  
Author(s):  
A. V. Churikov ◽  
A. V. Ivanishchev ◽  
I. A. Ivanishcheva ◽  
K. V. Zapsis ◽  
I. M. Gamayunova ◽  
...  
Keyword(s):  
Lithium Intercalation ◽  
Oxide Layers ◽  
Kinetics Of
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