Use of Mixed CH3–/HC(O)CH2CH2–Si(111) Functionality to Control Interfacial Chemical and Electronic Properties During the Atomic-Layer Deposition of Ultrathin Oxides on Si(111)
2015 ◽
Vol 6
(4)
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pp. 722-726
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2019 ◽
Vol 2
(12)
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pp. 8747-8756
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Keyword(s):
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2016 ◽
Vol 8
(44)
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pp. 30564-30575
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2011 ◽
Vol 119
(5)
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pp. 696-698
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2012 ◽
Vol 116
(32)
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pp. 16830-16840
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2004 ◽
Vol 457-460
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pp. 1369-1372
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