A Self-supporting Metal Fresnel Zone-plate to focus Extreme Ultra-violet and Soft X-Rays

Nature ◽  
1960 ◽  
Vol 186 (4729) ◽  
pp. 958-958 ◽  
Author(s):  
ALBERT V. BAEZ
1998 ◽  
Vol 524 ◽  
Author(s):  
S. Tamura ◽  
K. Ohtani ◽  
M. Yasumoto ◽  
K. Murali ◽  
N. Kamuo ◽  
...  

ABSTRACTA hard X-ray microbeam with submicrometer spot size from synchrotron radiation (SR) sources is expected to add a new dimension to various X-ray analysis methods. A Fresnel zone plate (FZP) is one of the promising focusing elements for X-rays. In order to develop high performance multilayer FZP for use in the hard X-ray region, Cu/Al concentric multilayers were fabricated by use of a DC sputtering deposition process. Lower Ar gas pressure or higher rotating speed of a wire substrate has been effective in forming smoother multilayer interfaces. From a focusing test of the Cu/Al FZP (100-zones) by the SR (λ= 0.154nm), microbeams of 1.5 μm φ and 0.8 μm φ have been achieved for the first- and third-order focal beams, respectively.


2003 ◽  
Vol 74 (11) ◽  
pp. 4948-4949 ◽  
Author(s):  
M. Awaji ◽  
Y. Suzuki ◽  
A. Takeuchi ◽  
H. Takano ◽  
N. Kamijo ◽  
...  

Vacuum ◽  
2006 ◽  
Vol 80 (7) ◽  
pp. 823-827 ◽  
Author(s):  
Shigeharu Tamura ◽  
Masato Yasumoto ◽  
Nagao Kamijo ◽  
Yoshio Suzuki ◽  
Mitsuhiro Awaji ◽  
...  

2012 ◽  
Vol 30 (1) ◽  
pp. 87-93 ◽  
Author(s):  
Xiao-Fang Wang ◽  
Jin-Yu Wang ◽  
Xiao-Hu Chen ◽  
Xin-Gong Chen ◽  
Lai Wei

AbstractTo diagnose the implosion of a laser-driven-fusion target such as the symmetry, the hydrodynamic instability at the interface, a high-resolution, large field-of-view kilo-electron-volt X-ray imaging is required. A Kirkpatrick-Baez (K-B) microscope is commonly used, but its field of view is limited to a few hundred microns as the resolution decreases rapidly with the increase of the field of view. A higher resolution could be realized by using a Fresnel zone plate (FZP) for imaging. Presented in this work is a numerical study on the imaging properties of an FZP at Ti-Kα wavelength of 0.275 nm, and a comparison to a K-B imager. It is found that the FZP can realize not only a resolution better than 1 µm, but also a field-of-view larger than 20 mm when the FZP is illuminated by X-rays of spectral bandwidth less than 1.75%. These results indicate the feasibility of applying the FZP in high-resolution, large field-of-view X-ray imaging.


2013 ◽  
Author(s):  
Levon Haroutunyan ◽  
Karapet Trouni ◽  
Armen Kuyumchyan

2015 ◽  
Vol 22 (3) ◽  
pp. 781-785 ◽  
Author(s):  
Su Yong Lee ◽  
Do Young Noh ◽  
Hae Cheol Lee ◽  
Chung-Jong Yu ◽  
Yeukuang Hwu ◽  
...  

Results are reported of direct-write X-ray lithography using a hard X-ray beam focused by a Fresnel zone plate with an outermost zone width of 40 nm. An X-ray beam at 7.5 keV focused to a nano-spot was employed to write arbitrary patterns on a photoresist thin film with a resolution better than 25 nm. The resulting pattern dimension depended significantly on the kind of underlying substrate, which was attributed to the lateral spread of electrons generated during X-ray irradiation. The proximity effect originated from the diffuse scattering near the focus and electron blur was also observed, which led to an increase in pattern dimension. Since focusing hard X-rays to below a 10 nm spot is currently available, the direct-write hard X-ray lithography developed in this work has the potential to be a promising future lithographic method.


Author(s):  
Daniel Jandura ◽  
Dusan Pudis ◽  
Tomas Mizera ◽  
Marek Vevericik ◽  
Peter Gaso

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