Visible light induced photocatalytic inactivation of bacteria by modified titanium dioxide films on organic polymers

A transparent polypropylene foil pre-treated with a low temperature plasma and covered with sensitized, nanocrystalline TiO2 thin film, appears to be a useful, self-sterilizing material activated upon visible light irradiation.

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The dependence of aluminum nitride thin-film microstructure on the number of low-temperature plasma-enhanced atomic layer deposition process cycles

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.06.064 ◽

2019 ◽

Vol 378 ◽

pp. 124744

Author(s):

M.G. Ambartsumov ◽

V.A. Tarala ◽

S.O. Krandievsky ◽

A.A. Kravtsov ◽

A.B. Sautiev ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atomic Layer Deposition ◽

Aluminum Nitride ◽

Atomic Layer ◽

Deposition Process ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Layer Deposition ◽

Film Microstructure

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Visible-Light Activity of Low-Temperature Plasma Treated TiO2 and Its Dependence on the Raw Material TiO2

Journal of the Japan Society of Colour Material ◽

10.4011/shikizai1937.73.580 ◽

2000 ◽

Vol 73 (12) ◽

pp. 580-586 ◽

Cited By ~ 1

Author(s):

Masahiro MIYOSHI ◽

Tatsuhiko IHARA ◽

Masazumi ANDO ◽

Shinichi SUGIHARA

Keyword(s):

Low Temperature ◽

Visible Light ◽

Raw Material ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Light Activity

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A Novel Method for Preparing V-doped Titanium Dioxide Thin Film Photocatalysts with High Photocatalytic Activity Under Visible Light Irradiation

Catalysis Letters ◽

10.1007/s10562-007-9179-5 ◽

2007 ◽

Vol 118 (3-4) ◽

pp. 254-259 ◽

Cited By ~ 50

Author(s):

De-En Gu ◽

Bang-Chao Yang ◽

Yong-Da Hu

Keyword(s):

Thin Film ◽

Titanium Dioxide ◽

Photocatalytic Activity ◽

Visible Light ◽

Visible Light Irradiation ◽

High Photocatalytic Activity ◽

Light Irradiation ◽

Novel Method ◽

Doped Titanium Dioxide

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Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

ACS Applied Materials & Interfaces ◽

10.1021/acsami.8b16443 ◽

2019 ◽

Vol 11 (3) ◽

pp. 3169-3180 ◽

Cited By ~ 11

Author(s):

Lukas Mai ◽

David Zanders ◽

Ersoy Subaşı ◽

Engin Ciftyurek ◽

Christian Hoppe ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Atomic Layer Deposition ◽

Thin Film Transistor ◽

Atomic Layer ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Layer Deposition

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Preparation of Optical Thin Film by Hybird-Low Temperature Plasma Surface Modification of Tellurium-Dioxide Crystal

Material Sciences ◽

10.12677/ms.2019.91004 ◽

2019 ◽

Vol 09 (01) ◽

pp. 25-31

Author(s):

永刚潘

Keyword(s):

Thin Film ◽

Surface Modification ◽

Low Temperature ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Optical Thin Film ◽

Plasma Surface Modification ◽

Tellurium Dioxide ◽

Plasma Surface

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Technical thin film formation methods in low temperature plasma

Conference Proceedings. 10th Anniversary. IMTC/94. Advanced Technologies in I & M. 1994 IEEE Instrumentation and Measurement Technolgy Conference (Cat. No.94CH3424-9) ◽

10.1109/imtc.1994.351914 ◽

2002 ◽

Author(s):

K.I. Montasser ◽

O.I. Mohamed

Keyword(s):

Thin Film ◽

Low Temperature ◽

Film Formation ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Thin Film Formation

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Properties of SiO N thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS–NH3–O2–N2 gas mixtures

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.01.119 ◽

2005 ◽

Vol 200 (1-4) ◽

pp. 680-685 ◽

Cited By ~ 11

Author(s):

J.H. Lee ◽

C.H. Jeong ◽

J.T. Lim ◽

N.G. Jo ◽

S.J. Kyung ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Mixtures ◽

Low Temperature Plasma ◽

Temperature Plasma

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Physical and chemical interactions between low temperature plasma and organic thin film. Clarification of the mechanism and its application to the molecular design of dry developable resist.

Hyomen Kagaku ◽

10.1380/jsssj.5.455 ◽

1984 ◽

Vol 5 (4) ◽

pp. 455-467 ◽

Cited By ~ 1

Author(s):

Minoru TSUDA

Keyword(s):

Thin Film ◽

Low Temperature ◽

Molecular Design ◽

Organic Thin Film ◽

Low Temperature Plasma ◽

Chemical Interactions ◽

Temperature Plasma ◽

Physical And Chemical

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Low-temperature plasma-deposited microcrystalline silicon thin films: an emerging material for stable thin film transistors

10.1117/12.476827 ◽

2003 ◽

Author(s):

Pere Roca i Cabarrocas ◽

Samir Kasouit ◽

B. Kalache ◽

Regis Vanderhaghen ◽

Y. Bonnassieux ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Low Temperature ◽

Thin Film Transistors ◽

Low Temperature Plasma ◽

Microcrystalline Silicon ◽

Temperature Plasma ◽

Silicon Thin Films

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Hydrogen-assisted low-temperature plasma-enhanced chemical vapor deposition of thin film encapsulation layers for top-emission organic light-emitting diodes

Organic Electronics ◽

10.1016/j.orgel.2021.106261 ◽

2021 ◽

pp. 106261

Author(s):

Junmo Kim ◽

Jeong Ha Hwang ◽

Yong Woo Kwon ◽

Hyeong Woo Bae ◽

Myungchan An ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Light Emitting Diodes ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Light Emitting ◽

Organic Light

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