Preparation and characterization of single crystalline anatase TiO2 films on LSAT (001) by MOCVD

TiO2 thin films with anatase structure have been prepared on [LaAlO3]0.3[SrAl0.5Ta0.5O3]0.7 (LSAT) (001) substrates by metalorganic chemical vapor deposition (MOCVD) in the substrate temperature range of 500–650 °C.

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor deposition

Materials Research Bulletin ◽

10.1016/0025-5408(89)90128-1 ◽

1989 ◽

Vol 24 (2) ◽

pp. 213-219 ◽

Cited By ~ 15

Author(s):

Angus B. Laurie ◽

Michael L. Norton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Normal Pressure ◽

Metalorganic Chemical

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Preparation and characterization of Pb(Nb,Ti)O3 thin films by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.371403 ◽

1999 ◽

Vol 86 (8) ◽

pp. 4559-4564 ◽

Cited By ~ 19

Author(s):

Tomokazu Matsuzaki ◽

Hiroshi Funakubo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation and characterization of PZT ferroelectric thin films by plasma enhanced metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589508012902 ◽

1995 ◽

Vol 9 (1-3) ◽

pp. 21-29 ◽

Cited By ~ 1

Author(s):

Won Gyu Lee ◽

Seong Ihl Woo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Pzt Ferroelectric Thin Films ◽

Metalorganic Chemical

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Characterization of SrBi2Ta2O9 ferroelectric thin films deposited at low temperatures by plasma-enhanced metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.119475 ◽

1997 ◽

Vol 71 (1) ◽

pp. 81-83 ◽

Cited By ~ 34

Author(s):

Nak-Jin Seong ◽

Soon-Gil Yoon ◽

Seaung-Suk Lee

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Low Temperatures ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Metalorganic Chemical

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Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.6015 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 6015-6018 ◽

Cited By ~ 12

Author(s):

Shiro Hino ◽

Makoto Nakayama ◽

Kenji Takahashi ◽

Hiroshi Funakubo ◽

Eisuke Tokumitsu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Characterization of MgxZn1−xO thin films grown on sapphire substrates by metalorganic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2010.10.036 ◽

2011 ◽

Vol 519 (6) ◽

pp. 1966-1970 ◽

Cited By ~ 12

Author(s):

C.C. Wu ◽

D.S. Wuu ◽

P.R. Lin ◽

T.N. Chen ◽

R.H. Horng ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Sapphire Substrates ◽

Metalorganic Chemical

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Preparation and characterization of Bi2Ti2O7 thin films grown by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90181-3 ◽

1994 ◽

Vol 139 (3-4) ◽

pp. 319-322 ◽

Cited By ~ 29

Author(s):

L.W. Fu ◽

H. Wang ◽

S.X. Shang ◽

X.L. Wang ◽

P.M. Xu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation and Characterization of C-Axis Oriented Epitaxial Bi2VO5.5 Thin Films Prepared by Metalorganic Chemical Vapor Deposition

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.214-215.189 ◽

2001 ◽

Vol 214-215 ◽

pp. 189-192

Author(s):

Katsuyuki Ishikawa ◽

Tomohiro Sakai ◽

Takayuki Watanabe ◽

Hiroshi Funakubo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Preparation and characterization of RuO2 thin films from Ru(CO)2(tmhd)2 by metalorganic chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00343-7 ◽

2002 ◽

Vol 413 (1-2) ◽

pp. 85-91 ◽

Cited By ~ 17

Author(s):

Reui-san Chen ◽

Ying-sheng Huang ◽

Yao-lun Chen ◽

Yun Chi

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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