The growth and thermal properties of Au deposited on Rh(111): formation of an ordered surface alloy

2016 ◽  
Vol 18 (36) ◽  
pp. 25230-25240 ◽  
Author(s):  
László Óvári ◽  
András Berkó ◽  
Gábor Vári ◽  
Richárd Gubó ◽  
Arnold Péter Farkas ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Ion Scattering ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Resolution Electron ◽  
Ion Scattering Spectroscopy ◽  
Scanning Tunnelling ◽  
Tunnelling Microscopy ◽  
Electron Energy Loss

Scanning tunnelling microscopy (STM), low energy ion scattering spectroscopy (LEIS), X-ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HREELS) were applied for studying Au deposited on the Rh(111) surface.

Adhesion activation of Twaron®aramid fibres studied with low-energy ion scattering and x-ray photoelectron spectroscopy

2001 ◽  
Vol 31 (12) ◽  
pp. 1079-1084 ◽  
Author(s):  
P. J. de Lange ◽  
P. G. Akker ◽  
A. J. H. Maas ◽  
A. Knoester ◽  
H. H. Brongersma
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Ion Scattering ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Aramid Fibres

GROWTH AND STRUCTURE OF hcp Ti FILMS ON Al(111) SURFACES

1999 ◽  
Vol 06 (05) ◽  
pp. 775-780 ◽  
Author(s):  
Y. W. KIM ◽  
G. A. WHITE ◽  
N. R. SHIVAPARAN ◽  
M. A. TETER ◽  
R. J. SMITH
Keyword(s):  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Three Dimensional ◽  
High Energy ◽  
Low Energy ◽  
Ion Scattering ◽  
Island Growth ◽  
X Ray ◽  
Low Energy Ion Scattering ◽  
Ti Films

The structure of thin Ti films grown on Al(111) surfaces at room temperature has been studied using high energy ion scattering/channeling (HEIS), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), low energy electron diffraction (LEED) and X-ray photoelectron diffraction (XPD). Our results show that Ti grows in the SK mode on the Al(111) surface. Ti atoms form a two-dimensional overlayer up to a deposition of about 2 ML Ti, followed by three-dimensional island growth with additional Ti deposition. The Ti islands cover the surface completely at about 12 ML of Ti deposition. XPD results show that the Ti overlayer has a well-ordered hcp Ti(0001) structure on the fcc Al(111) surface, in remarkable contrast to the fcc Ti film growth observed on Al(001) and Al(110) surfaces.

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