Atomic layer deposition and first principles modeling of glassy Li3BO3–Li2CO3 electrolytes for solid-state Li metal batteries

2018 ◽  
Vol 6 (40) ◽  
pp. 19425-19437 ◽  
Author(s):  
Eric Kazyak ◽  
Kuan-Hung Chen ◽  
Andrew L. Davis ◽  
Seungho Yu ◽  
Adrian J. Sanchez ◽  
...  

Glassy Li3BO3–Li2CO3 ALD films are deposited and shown to have excellent stability against Li metal and high ionic conductivity.

Author(s):  
R. Sparks ◽  
G. Jursich ◽  
A. Zdunek ◽  
J.I. Rossero ◽  
C.G. Takoudis

Current Solid Oxide Fuel Cell (SOFC) designs have operating temperatures between 800-1000 °C. Reducing this temperature to 500-600 °C would allow efficient utilization in varied applications. Yttria Doped Ceria (YDC) films show high ionic conductivity when used as fuel cell electrolytes in lower temperature ranges. This investigation shows that stoichiometric tunability of YDC film composition can be achieved through Atomic Layer Deposition (ALD). Film resistivity at room temperature is measured using a custom four-point probe sensor Film resistance analysis provides a method for evaluating the effect of doping and thickness of the film on desirable SOFC electrolyte characteristics such as high ionic conductivity.


2017 ◽  
Vol 29 (8) ◽  
pp. 3740-3753 ◽  
Author(s):  
Alexander J. Pearse ◽  
Thomas E. Schmitt ◽  
Elliot J. Fuller ◽  
Farid El-Gabaly ◽  
Chuan-Fu Lin ◽  
...  

2015 ◽  
Vol 26 (6) ◽  
pp. 064002 ◽  
Author(s):  
Giuseppe Fiorentino ◽  
Sten Vollebregt ◽  
F D Tichelaar ◽  
Ryoichi Ishihara ◽  
Pasqualina M Sarro

2018 ◽  
Vol 30 (8) ◽  
pp. 2526-2534 ◽  
Author(s):  
David M. Stewart ◽  
Alexander J. Pearse ◽  
Nam S. Kim ◽  
Elliot J. Fuller ◽  
A. Alec Talin ◽  
...  

RSC Advances ◽  
2020 ◽  
Vol 10 (28) ◽  
pp. 16584-16592
Author(s):  
Kyungtae Lee ◽  
Youngseon Shim

Energy diagram of reaction pathways for decomposition of different aminosilane precursors on a WO3 (001) surface.


RSC Advances ◽  
2017 ◽  
Vol 7 (88) ◽  
pp. 55750-55755 ◽  
Author(s):  
Hwanyeol Park ◽  
Sungwoo Lee ◽  
Ho Jun Kim ◽  
Euijoon Yoon ◽  
Gun-Do Lee

In the fabrication process of memory devices, a void-free tungsten (W) gate process with good conformability is very important for improving the conductivity of the W gate, leading to enhancement of device performance.


2018 ◽  
Vol 10 (2) ◽  
pp. 1654-1661 ◽  
Author(s):  
Biqiong Wang ◽  
Yang Zhao ◽  
Mohammad Norouzi Banis ◽  
Qian Sun ◽  
Keegan R. Adair ◽  
...  

2009 ◽  
Vol 113 (42) ◽  
pp. 18385-18390 ◽  
Author(s):  
Tina C. Li ◽  
Márcio S. Góes ◽  
Francisco Fabregat-Santiago ◽  
Juan Bisquert ◽  
Paulo R. Bueno ◽  
...  

2013 ◽  
Vol 117 (39) ◽  
pp. 20260-20267 ◽  
Author(s):  
Jian Liu ◽  
Mohammad N. Banis ◽  
Xifei Li ◽  
Andrew Lushington ◽  
Mei Cai ◽  
...  

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