Low temperature radical initiated hydrosilylation of silicon quantum dots

2020 ◽  
Vol 222 ◽  
pp. 190-200
Author(s):  
Timothy T. Koh ◽  
Tingting Huang ◽  
Joseph Schwan ◽  
Pan Xia ◽  
Sean T. Roberts ◽  
...  

Non-thermal plasma synthesized silicon QDs are functionalized with aromatic and aliphatic ligands using a 2,2′-azobis(2-methylpropionitrile) AIBN radical initiator with hydrosilylation at 60 °C for photon upconversion.

2018 ◽  
Vol 299 ◽  
pp. 263-271 ◽  
Author(s):  
David Yap ◽  
Jean-Michel Tatibouët ◽  
Catherine Batiot-Dupeyrat

2011 ◽  
Vol 383-390 ◽  
pp. 3092-3098 ◽  
Author(s):  
Kai Li ◽  
Xiao Long Tang ◽  
Hong Hong Yi ◽  
Ping Ning ◽  
Zhi Qing Ye ◽  
...  

Mn-Ni-Ox catalyst was prepared by the co-precipitation method. The most active catalysts were obtained with a molar Ni/ (Mn+Ni) ratio of 0.1. The results showed that over this catalyst, NO oxidation conversion reached 59% at 125°C and 50% at 150°C with a high space velocity of 35000h-1. Their surface properties were evaluated by means of scanning electron microscopy (SEM). The process of non-thermal plasma-assisted catalytic oxidation of NO under low-temperature was studied. And the NO conversion could reach 80% with the non-thermal plasma-assisting at 150°C when the input voltage was 30V. The increasing activities at low temperature(50~175°C)were more apparently higher than high temperature by plasma. And the low-temperature catalytic activity of the catalyst was increased with the increase of the input voltage.


2012 ◽  
Vol 116 (6) ◽  
pp. 3979-3987 ◽  
Author(s):  
I. E. Anderson ◽  
R. A. Shircliff ◽  
C. Macauley ◽  
D. K. Smith ◽  
B. G. Lee ◽  
...  

1998 ◽  
Vol 133 (1-3) ◽  
pp. 49-63 ◽  
Author(s):  
A. MIZUNO ◽  
B.S. RAJANIKANTH ◽  
K. SHIMIZU ◽  
K. KINOSHITA ◽  
K. YANAGIHARA ◽  
...  

2017 ◽  
Vol 129 (20) ◽  
pp. 5671-5675 ◽  
Author(s):  
Cristina E. Stere ◽  
James A. Anderson ◽  
Sarayute Chansai ◽  
Juan Jose Delgado ◽  
Alexandre Goguet ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document