Facet stability of GaN during tri-halide vapor phase epitaxy: an ab initio-based approach
Keyword(s):
An ab initio-based approach is used to study the facet stability of GaN during THVPE. The surface phase diagrams as functions of temperature and pressure are determined. Wulff construction is used to predict the crystal shape.
2017 ◽
Vol 254
(8)
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pp. 1600706
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2017 ◽
Vol 254
(8)
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pp. 1600679
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2015 ◽
Vol 54
(8)
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pp. 085502
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2020 ◽
Vol 257
(4)
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pp. 1900523
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2019 ◽
Vol 123
(4)
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pp. 2321-2328
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2009 ◽
Vol 6
(S2)
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pp. S301-S304
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2016 ◽
Vol 120
(46)
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pp. 26249-26258
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