In-situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

2022 ◽  
Author(s):  
Rachel A. Nye ◽  
Siyao Wang ◽  
Stefan Uhlenbrock ◽  
John A. Smythe III ◽  
Gregory N. Parsons

Organic thin films formed by molecular layer deposition (MLD) are important for next-generation electronics, energy storage, photoresists, protective barriers and other applications. This study uses in situ ellipsometry and quartz...

2010 ◽  
Vol 1249 ◽  
Author(s):  
Stacey Bent ◽  
Paul William Loscutoff ◽  
Scott Clendenning

AbstractDevice scaling predicts that copper barrier layers of under 3 nm in thickness will soon be needed in back-end processing for integrated circuits, motivating the development of new barrier layer materials. In this work, nanoscale organic thin films for use as possible copper diffusion barrier layers are deposited by molecular layer deposition (MLD) utilizing a series of self-limiting reactions of organic molecules. MLD can be used to tailor film properties to optimize desirable barrier properties, including density, copper surface adhesion, thermal stability, and low copper diffusion. Three systems are examined as copper diffusion barriers, a polyurea film deposited by the reaction of 1,4-phenylene diisocyanate (PDIC) and ethylenediamine (ED), a polyurea film with a sulfide-modified backbone, and a polythiourea films using a modified coupling chemistry. Following deposition of the MLD films, copper is sputter deposited. The copper diffusion barrier properties of the film are tested through adhesion and annealing tests, including 4-point bend testing and TEM imaging to examine the level of copper penetration. The promise and challenges of MLD-formed organic copper diffusion barriers will be discussed.


2017 ◽  
Vol 52 (11) ◽  
pp. 6216-6224 ◽  
Author(s):  
Lukas Mai ◽  
Zivile Giedraityte ◽  
Marcel Schmidt ◽  
Detlef Rogalla ◽  
Sven Scholz ◽  
...  

Author(s):  
Muhammad Safdar ◽  
Amr Ghazy ◽  
Minnea Tuomisto ◽  
Mika Lastusaari ◽  
Maarit Karppinen

AbstractHere we show that the backbone of the organic ligand has a profound impact on the luminescence characteristics of lanthanide-organic materials. We employ the emerging atomic/molecular layer deposition (ALD/MLD) technique to deposit europium-based thin films where the organic ligands vary in terms of the number of aromatic rings in their backbone (benzene, naphthalene and anthracene). Enlarging the backbone shifts the excitation towards visible wavelengths, but it simultaneously decreases the emission intensity. Moreover, for the Eu-terephthalate films with the single benzene ring as the organic backbone, we investigate the effects of diluting the Eu3+ concentration with Y3+ to reveal that the emission intensity is optimized around 12% Eu3+ concentration. Interestingly, such a dependence of luminescence intensity on the concentration of emitting species suggests that our (Eu,Y)-organic thin films behave more like ionic phosphors than discrete metal–ligand molecules. Graphical abstract


2020 ◽  
Vol 49 (32) ◽  
pp. 11310-11316
Author(s):  
Aida Khayyami ◽  
Anish Philip ◽  
Jenna Multia ◽  
Maarit Karppinen

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.


Sign in / Sign up

Export Citation Format

Share Document