scholarly journals Chemical and topographical patterns combined with solution shear for selective-area deposition of highly-aligned semiconducting carbon nanotubes

2021 ◽  
Vol 3 (6) ◽  
pp. 1767-1775
Author(s):  
Jonathan H. Dwyer ◽  
Anjali Suresh ◽  
Katherine R. Jinkins ◽  
Xiaoqi Zheng ◽  
Michael S. Arnold ◽  
...  

Selective shear deposition of polymer-wrapped semiconducting carbon nanotubes (s-CNTs) into densely packed, highly aligned arrays of s-CNTs using removable chemical and topographical patterns.

1989 ◽  
Vol 161 ◽  
Author(s):  
D.L. Dreifus ◽  
Y. Lansari ◽  
J.W. Han ◽  
S. Hwang ◽  
J.W. Cook ◽  
...  

ABSTRACTII-VI semiconductor surface passivants, insulators, and epitaxial films have been deposited onto selective surface areas by employing a new masking and lift-off technique. The II-VI layers were grown by either conventional or photoassisted molecular beam epitaxy (MBE). CdTe has been selectively deposited onto HgCdTe epitaxial layers as a surface passivant. Selective-area deposition of ZnS has been used in metal-insulator-semiconductor (MIS) structures. Low resistance ohmic contacts to p-type CdTe:As have also been realized through the use of selectively-placed thin films of the semi-metal HgTe followed by a thermal evaporation of In. Epitaxial layers of HgTe, HgCdTe, and HgTe-CdTe superlattices have also been grown in selective areas on CdZnTe substrates, exhibiting specular morphologies and double-crystal x-ray diffraction rocking curves (DCXD) with full widths at half maximum (FWHMs) as narrow as 140 arcseconds.


1992 ◽  
Vol 282 ◽  
Author(s):  
Seong-Don Hwang ◽  
S. S. Kher ◽  
J. T. Spencer ◽  
P. A. Dowben

ABSTRACTIt has been demonstrated that copper can be selectively deposited on a variety of substrates including Teflon (polytetrafluroethylene or PTFE), Kapton (polyimide resin), silicon and gallium arsnide from solution by photo-assisted initiated deposition. A copper containing solution was prepared from a mixture of copper(I) chloride (Cu2Ci2) and decaborane (B10H14) in diethyl ether and/or THF (tetrahydrofuran). The copper films were fabricated by ultraviolet photolytic decomposition of copper chloride and polyhedral borane clusters. This liquid phase deposition has a gas-phase cluster analog that also results in copper deposition via pyrolysis. The approach of depositing metal thin films selectively by pholysis from solution is a novel and an underutilized approach to selective area deposition.


Carbon ◽  
2007 ◽  
Vol 45 (14) ◽  
pp. 2732-2736 ◽  
Author(s):  
Erika Widenkvist ◽  
Junxin Li ◽  
Ulf Jansson ◽  
Helena Grennberg

2009 ◽  
Vol 95 (17) ◽  
pp. 173115 ◽  
Author(s):  
S. Esconjauregui ◽  
B. C. Bayer ◽  
M. Fouquet ◽  
C. T. Wirth ◽  
C. Ducati ◽  
...  

2019 ◽  
Vol 19 (2) ◽  
pp. 672-677 ◽  
Author(s):  
Raju Ahmed ◽  
Anwar Siddique ◽  
Jonathan Anderson ◽  
Chris Engdahl ◽  
Mark Holtz ◽  
...  

Nano Letters ◽  
2004 ◽  
Vol 4 (12) ◽  
pp. 2421-2426 ◽  
Author(s):  
Coskun Kocabas ◽  
Matthew A. Meitl ◽  
Anshu Gaur ◽  
Moonsub Shim ◽  
J. A. Rogers

1983 ◽  
Vol 29 ◽  
Author(s):  
S. J. C. Irvine ◽  
J. B. Mullin ◽  
D. J. Robbins ◽  
J. L. Glasper

ABSTRACTA preliminary study has been made of the UV photolysis of metal-organic compounds of Hg, Cd and Te which could be used for low-temperature, selective-area deposition of cadmium mercury telluride (CMT). High-resolution UV absorption spectra have been measured for dimethylcadmium (CdMe2), dimethylmercury (HgMe2) and diethyltelluride (TeEt2). Possible modes for photodissociation are discussed in the light of these results. The photodissociation of these alkyls was attempted in a hydrogen stream at atmospheric pressure using a mercury-xenon lamp, deposition being being onto a silica reaction tube. Yields of Cd, Hg and Te were measured under different deposition conditions to determine the dependence on UV intensity, alkyl concentration and flow velocity.


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