Electrical properties of silicon dioxide deposited at low temperature by metal-organic microwave plasma CVD technique

1990 ◽  
Vol 26 (14) ◽  
pp. 1082 ◽  
Author(s):  
S.K. Ray ◽  
C.K. Maiti ◽  
N.B. Chakrabarti
2013 ◽  
Vol 46 (6) ◽  
pp. 063001 ◽  
Author(s):  
Takatoshi Yamada ◽  
Jaeho Kim ◽  
Masatou Ishihara ◽  
Masataka Hasegawa

1990 ◽  
Vol 29 (Part 2, No. 2) ◽  
pp. L358-L360 ◽  
Author(s):  
Yoshihiro Someno ◽  
Makoto Sasaki ◽  
Toshio Hirai

1990 ◽  
Vol 29 (Part 2, No. 8) ◽  
pp. L1483-L1485 ◽  
Author(s):  
Jin Wei ◽  
Hiroshi Kawarada ◽  
Jun-ichi Suzuki ◽  
Akio Hiraki

2004 ◽  
Vol 13 (1) ◽  
pp. 198-202 ◽  
Author(s):  
Mariko Suzuki ◽  
Hiroaki Yoshida ◽  
Naoshi Sakuma ◽  
Tomio Ono ◽  
Tadashi Sakai ◽  
...  

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