Gate oxide thickness dependence of high-field-induced interface state generation in thin thermal oxides

1990 ◽  
Vol 26 (15) ◽  
pp. 1124 ◽  
Author(s):  
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D.L. Kwong
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...  

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Author(s):  
M Ťapajna ◽  
A Paskaleva ◽  
E Atanassova ◽  
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1989 ◽  
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