Helium‐excited reactive magnetron sputtering for stress‐free silicon nitride films

Applied Physics Letters ◽

10.1063/1.109444 ◽

1993 ◽

Vol 62 (17) ◽

pp. 2116-2118 ◽

Author(s):

Iwao Sugimoto ◽

Satoko Nakano

Keyword(s):

Silicon Nitride ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Silicon Nitride Films ◽

Download Full-text

Optical Properties of Aluminum- and Silicon-Nitride Films and Al–Si–N Nanocomposite Coatings Deposited by Reactive Magnetron Sputtering

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques ◽

10.1134/s1027451021010274 ◽

2021 ◽

Vol 15 (1) ◽

pp. 139-146

Author(s):

F. V. Konusov ◽

S. K. Pavlov ◽

A. L. Lauk ◽

A. V. Kabyshev ◽

R. M. Gadirov

Keyword(s):

Optical Properties ◽

Silicon Nitride ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Nanocomposite Coatings ◽

Reactive Magnetron ◽

Silicon Nitride Films

Download Full-text

Titanium Nitride - Silicon Nitride Composite Coatings Deposited by Reactive Magnetron Sputtering

Materials Science Forum ◽

10.4028/www.scientific.net/msf.287-288.267 ◽

1998 ◽

Vol 287-288 ◽

pp. 267-268

Author(s):

Jörg Patscheider ◽

M Diserens ◽

F. Lévy

Keyword(s):

Silicon Nitride ◽

Magnetron Sputtering ◽

Titanium Nitride ◽

Composite Coatings ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

Download Full-text

Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering

10.3384/diss.diva-145177 ◽

2018 ◽

Author(s):

Tuomas Hänninen

Keyword(s):

Silicon Nitride ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

Download Full-text

Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering

Microelectronics Journal ◽

10.1016/j.mejo.2008.07.017 ◽

2009 ◽

Vol 40 (1) ◽

pp. 66-69 ◽

Author(s):

Luís da Silva Zambom ◽

Ronaldo Domingues Mansano ◽

Ana Paula Mousinho

Keyword(s):

Silicon Nitride ◽

Low Temperature ◽

Magnetron Sputtering ◽

Silicon Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Low Temperature Deposition ◽

Temperature Deposition

Download Full-text

Plasma emission spectroscopy and its relation to the refractive index of silicon nitride thin films deposited by reactive magnetron sputtering

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/aaa8d4 ◽

2018 ◽

Vol 51 (9) ◽

pp. 095203 ◽

Author(s):

R Sanginés ◽

N Abundiz-Cisneros ◽

O Hernández Utrera ◽

C Diliegros-Godines ◽

R Machorro-Mejía

Keyword(s):

Refractive Index ◽

Silicon Nitride ◽

Magnetron Sputtering ◽

Emission Spectroscopy ◽

Reactive Magnetron Sputtering ◽

Plasma Emission ◽

Reactive Magnetron ◽

Plasma Emission Spectroscopy

Download Full-text

Low temperature deposition of low stress silicon nitride by reactive magnetron sputtering

Journal of Physics Conference Series ◽

10.1088/1742-6596/370/1/012015 ◽

2012 ◽

Vol 370 ◽

pp. 012015 ◽

Author(s):

A P Mousinho ◽

R D Mansano ◽

L S Zambom ◽

A Passaro

Keyword(s):

Silicon Nitride ◽

Low Temperature ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Low Temperature Deposition ◽

Temperature Deposition

Download Full-text

Silicon nitride thin films deposited by DC pulse reactive magnetron sputtering

10.1117/12.888164 ◽

2010 ◽

Author(s):

Xiao-Feng Zhang ◽

Pei-Gang Wen ◽

Yue Yan

Keyword(s):

Silicon Nitride ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

Download Full-text

INFLUENCE OF DEPOSITION PARAMETERS ON THE STRUCTURE AND THERMAL STABILITY OF Ti-Al-N COATINGS PRODUCED BY REACTIVE MAGNETRON SPUTTERING

High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes) ◽

10.1615/hightempmatproc.2015015725 ◽

2015 ◽

Vol 19 (2) ◽

pp. 105-112

Author(s):

F. F. Komarov ◽

Iryna M. Klimovich ◽

O. V. Korolik ◽

V. A. Zaikov ◽

O. R. Lyudchik

Keyword(s):

Thermal Stability ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Deposition Parameters ◽

Thermal Stability Of

Download Full-text

Microstructure and electrical property of tantalum oxynitride thin films prepared using high-power impulse reactive magnetron sputtering

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/abc0ae ◽

2020 ◽

Vol 59 (11) ◽

pp. 116502

Author(s):

Ping-Yuan Lee ◽

Cheng-Xian Lin ◽

Ying-Chieh Lee

Keyword(s):

Electrical Property ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

Download Full-text

Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering

Journal of Inorganic Materials ◽

10.3724/sp.j.1077.2011.01287 ◽

2011 ◽

Vol 26 (12) ◽

pp. 1287-1292 ◽

Author(s):

Chang YAN ◽

Fang-Yang LIU ◽

Yan-Qing LAI ◽

Yi LI ◽

Jie LI ◽

...

Keyword(s):

Electrical Property ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Dc Reactive Magnetron Sputtering

Download Full-text