Low damage and residue‐free dry etching of 6H–SiC using electron cyclotron resonance plasma

1995 ◽  
Vol 67 (3) ◽  
pp. 368-370 ◽  
Author(s):  
K. Xie ◽  
J. R. Flemish ◽  
J. H. Zhao ◽  
W. R. Buchwald ◽  
L. Casas
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Dry Etching ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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