High rate etching of SiC using inductively coupled plasma reactive ion etching in SF6-based gas mixtures
Keyword(s):
2007 ◽
pp. 503-506
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2004 ◽
Vol 10
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pp. 103-106
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Vol 11
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pp. 16-19
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2006 ◽
Vol 21
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pp. 971-974
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2007 ◽
Vol 124-126
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pp. 503-506
2003 ◽
Vol 32
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pp. 1-4
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Vol 43
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pp. 82-85
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