Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source
2011 ◽
Vol 50
(6)
◽
pp. 06GG07
◽
2011 ◽
Vol 50
(6S)
◽
pp. 06GG07
◽
2005 ◽
Vol 34
(6)
◽
pp. 740-745
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2015 ◽
Vol 32
(5)
◽
pp. 058102
◽
1999 ◽
Vol 17
(3)
◽
pp. 768-773
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