AlGaN/GaN metal–oxide–semiconductor high electron mobility transistors using Sc2O3 as the gate oxide and surface passivation

2003 ◽  
Vol 82 (15) ◽  
pp. 2530-2532 ◽  
Author(s):  
R. Mehandru ◽  
B. Luo ◽  
J. Kim ◽  
F. Ren ◽  
B. P. Gila ◽  
...  
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