Structural and optical properties of near-surface GaInNAs/GaAs quantum wells at emission wavelength of 1.3 μm

2003 ◽  
Vol 82 (15) ◽  
pp. 2428-2430 ◽  
Author(s):  
H. F. Liu ◽  
C. S. Peng ◽  
E.-M. Pavelescu ◽  
S. Karirinne ◽  
T. Jouhti ◽  
...  
2004 ◽  
Vol 268 (3-4) ◽  
pp. 336-341 ◽  
Author(s):  
D.S Jiang ◽  
L.F Bian ◽  
X.G Liang ◽  
K Chang ◽  
B.Q Sun ◽  
...  

2007 ◽  
Vol 38 (1-2) ◽  
pp. 152-155 ◽  
Author(s):  
T. Mchedlidze ◽  
T. Arguirov ◽  
M. Kittler ◽  
R. Roelver ◽  
B. Berghoff ◽  
...  

2000 ◽  
Vol 221 (1-4) ◽  
pp. 368-372 ◽  
Author(s):  
Dong-Joon Kim ◽  
Yong-Tae Moon ◽  
Keun-Man Song ◽  
Chel-Jong Choi ◽  
Young-Woo Ok ◽  
...  

2000 ◽  
Vol 5 (S1) ◽  
pp. 977-983
Author(s):  
Yong-Hwan Kwon ◽  
G. H. Gainer ◽  
S. Bidnyk ◽  
Y. H. Cho ◽  
J. J. Song ◽  
...  

The effect of In on the structural and optical properties of InxGa1−xN/GaN multiple quantum wells (MQWs) was investigated. These were five-period MQWs grown on sapphire by metalorganic chemical vapor deposition. Increasing the In composition caused broadening of the high-resolution x-ray diffraction superlattice satellite peak and the photoluminescence-excitation bandedge. This indicates that the higher In content degrades the interface quality because of nonuniform In incorporation into the GaN layer. However, the samples with higher In compositions have lower room temperature (RT) stimulated (SE) threshold densities and lower nonradiative recombination rates. The lower RT SE threshold densities of the higher In samples show that the suppression of nonradiative recombination by In overcomes the drawback of greater interface imperfection.


1990 ◽  
Vol 41 (18) ◽  
pp. 12599-12606 ◽  
Author(s):  
O. Brandt ◽  
L. Tapfer ◽  
R. Cingolani ◽  
K. Ploog ◽  
M. Hohenstein ◽  
...  

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