Formation of Very Thin Oxide Films on Metals: Contact Potential Measurements during the Oxidation of (100) Cu

1970 ◽  
Vol 53 (9) ◽  
pp. 3544-3548 ◽  
Author(s):  
Joseph E. Boggio

2011 ◽  
Vol 2 ◽  
pp. 1-14 ◽  
Author(s):  
Thomas König ◽  
Georg H Simon ◽  
Lars Heinke ◽  
Leonid Lichtenstein ◽  
Markus Heyde

Surfaces of thin oxide films were investigated by means of a dual mode NC-AFM/STM. Apart from imaging the surface termination by NC-AFM with atomic resolution, point defects in magnesium oxide on Ag(001) and line defects in aluminum oxide on NiAl(110), respectively, were thoroughly studied. The contact potential was determined by Kelvin probe force microscopy (KPFM) and the electronic structure by scanning tunneling spectroscopy (STS). On magnesium oxide, different color centers, i.e., F0, F+, F2+ and divacancies, have different effects on the contact potential. These differences enabled classification and unambiguous differentiation by KPFM. True atomic resolution shows the topography at line defects in aluminum oxide. At these domain boundaries, STS and KPFM verify F2+-like centers, which have been predicted by density functional theory calculations. Thus, by determining the contact potential and the electronic structure with a spatial resolution in the nanometer range, NC-AFM and STM can be successfully applied on thin oxide films beyond imaging the topography of the surface atoms.







1989 ◽  
pp. 303-310
Author(s):  
T. Paul Adl ◽  
H. F. Stehmeyer




2007 ◽  
Vol 19 (24) ◽  
pp. NA-NA
Author(s):  
M. Takahashi ◽  
T. Maeda ◽  
K. Uemura ◽  
J. Yao ◽  
Y. Tokuda ◽  
...  




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