Field emission properties of self-assembled silicon nanostructures on n- and p-type silicon

2004 ◽  
Vol 85 (15) ◽  
pp. 3277-3279 ◽  
Author(s):  
S. Johnson ◽  
A. Markwitz ◽  
M. Rudolphi ◽  
H. Baumann ◽  
S. P. Oei ◽  
...  
Author(s):  
Victor Kleshch ◽  
Pavel Serbun ◽  
Anton Orekhov ◽  
Dirk Lutzenkirchen-Hecht ◽  
Alexander Obraztsov ◽  
...  

2006 ◽  
Vol 6 (3) ◽  
pp. 503-506 ◽  
Author(s):  
S. Johnson ◽  
A. Markwitz ◽  
M. Rudolphi ◽  
H. Baumann ◽  
S.P. Oei ◽  
...  

2019 ◽  
Vol 89 (6) ◽  
pp. 952
Author(s):  
Р.К. Яфаров

AbstractVariations of the morphology and field-emission properties of surface-structured n - and p -type silicon wafers have been studied. The silicon surface has been structured by etching in a fluorine–carbon plasma and depositing subnanodimensional island carbon masks. It has been shown that surface structuring in a fluorine–carbon plasma makes it possible to reach desired field-emission currents in electric fields of different strengths. Physicochemical models of field emission mechanisms and models of destruction of surface-modified multipoint silicon array cathodes have been considered.


Author(s):  
Christoph Langer ◽  
Christian Prommesberger ◽  
Robert Ławrowski ◽  
Rupert Schreiner ◽  
Pavel Serbun ◽  
...  

2007 ◽  
Author(s):  
M. Cahay ◽  
K. Garre ◽  
J. W. Fraser ◽  
D. J. Lockwood ◽  
V. Semet ◽  
...  

Nanoscale ◽  
2013 ◽  
Vol 5 (24) ◽  
pp. 12388 ◽  
Author(s):  
Jian-Hua Deng ◽  
Bin Yu ◽  
Guo-Zheng Li ◽  
Xing-Gang Hou ◽  
Meng-Li Zhao ◽  
...  

2006 ◽  
Vol 508 (1-2) ◽  
pp. 218-221 ◽  
Author(s):  
S.W. Lee ◽  
Y.L. Chueh ◽  
H.C. Chen ◽  
L.J. Chen ◽  
P.S. Chen ◽  
...  

Shinku ◽  
2002 ◽  
Vol 45 (9) ◽  
pp. 706-709
Author(s):  
Tomomi YOSHIMOTO ◽  
Dai KAMIMARU ◽  
Satoru KIKUCHI ◽  
Naohiro YOKOGAWA ◽  
Tatsuo IWATA

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