Effect of ion beam energy and polymer weight on the thickness of nanowires produced by ion bombardment of polystyrene thin films

2005 ◽  
Vol 87 (23) ◽  
pp. 233119 ◽  
Author(s):  
Satoshi Tsukuda ◽  
Shu Seki ◽  
Seiichi Tagawa ◽  
Masaki Sugimoto
Keyword(s):  
Thin Films ◽  
Beam Energy ◽  
Ion Beam ◽  
Ion Bombardment

Ion Beam Mixing of Ni-Ti Bilayered Thin Films

1985 ◽  
Vol 43 ◽  
pp. 290-291
Author(s):  
A. K. Rai ◽  
R. S. Bhattacharya ◽  
M. H. Rashid
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Amorphous Alloys ◽  
Ion Beam ◽  
Ion Bombardment ◽  
High Energy ◽  
Mixing Efficiency ◽  
Ion Beam Mixing ◽  
Enhanced Diffusion ◽  
Binary Metal

Ion beam mixing has recently been found to be an effective method of producing amorphous alloys in the binary metal systems where the two original constituent metals are of different crystal structure. The mechanism of ion beam mixing are not well understood yet. Several mechanisms have been proposed to account for the observed mixing phenomena. The first mechanism is enhanced diffusion due to defects created by the incoming ions. Second is the cascade mixing mechanism for which the kinematicel collisional models exist in the literature. Third mechanism is thermal spikes. In the present work we have studied the mixing efficiency and ion beam induced amorphisation of Ni-Ti system under high energy ion bombardment and the results are compared with collisional models. We have employed plan and x-sectional veiw TEM and RBS techniques in the present work.

Ion Beam Processing of Optical Thin Films

1989 ◽  
Vol 152 ◽  
Author(s):  
U. J. Gibson
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Sensitive Function ◽  
Deposition Conditions

ABSTRACTThe microstructure and optical properties of vacuum evaporated coatings are a sensitive function of the deposition conditions. In recent years, ion bombardment has been used increasingly for the production of denser, more stable coatings of oxides and other materials. In addition to modifying the microstructure, ion bombardment is emerging as a valuable tool for altering the composition (and hence the optical properties) of thin films. A discussion of the effects of ion beam processing and the methods used to analyze the changes in these films is presented.

scholarly journals The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition

2008 ◽  
Vol 516 (7) ◽  
pp. 1365-1369 ◽  
Author(s):  
Li-Jian Meng ◽  
Jinsong Gao ◽  
M.P. dos Santos ◽  
Xiaoyi Wang ◽  
Tongtong Wang
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Beam Energy ◽  
Ion Beam ◽  
Oxide Thin Films ◽  
Ion Beam Assisted Deposition

Effect of Microstructure on Microhardness of AlN Thin Films

2001 ◽  
Vol 695 ◽  
Author(s):  
Shuichi Miyabe ◽  
Masami Aono ◽  
Nobuaki Kitazawa ◽  
Yoshihisa Watanabe
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Beam Energy ◽  
Ion Beam ◽  
Columnar Structure ◽  
Granular Structure ◽  
Nano Indentation ◽  
Ion Beam Assisted Deposition ◽  
Film Microstructure ◽  
Nitrogen Ion

ABSTRACTAluminum nitride (AlN) thin films with columnar and granular structures were prepared by ion-beam assisted deposition method by changing nitrogen ion beam energy, and the effects of the film microstructure and film thickness on their microhardness were studied by using a nano-indentation system with the maximum force of 3 mN. For the columnar structure film of 600 nm in thickness, the microhardness is found to be approximately 24 GPa when the normalized penetration depth to the film thickness is about 0.1. For the granular structure film of 700 nm in thickness, the microhardness is found to be approximately 14 GPa. These results reveal that the microhardness of the AlN films strongly depends on the film microstructure, which can be controlled by regulating the nitrogen ion beam energy.

Ion-Beam-Assisted Deposition of Metal Nanocluster thin Films with Nonlinear Optical Properties

1995 ◽  
Vol 396 ◽  
Author(s):  
C. M. Cotell ◽  
C.A. Carosella ◽  
S.R. Flom ◽  
S. Schiestel ◽  
N. Haralampus ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Nonlinear Optical ◽  
Uv Spectroscopy ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Plan View ◽  
Ion Beam Assisted Deposition ◽  
Metal Nanocluster ◽  
Post Deposition

AbstractMetal nanocluster thin films (∼200 nm thickness) consisting of noble metal (Au) clusters (5-30 nm) in an active metal oxide (Nb2O5) matrix were deposited by evaporation or ion beam assisted deposition (IBAD). In some cases the films were given a post-deposition anneal. The microstructure of the films was examined by plan view and cross sectional transmission electron microscopy (TEM). The size of the metal nanoclusters was found to depend upon the temperature of the post-deposition anneal as well as the conditions of ion bombardment. Ion bombardment was found to stabilize smaller size particles. The linear optical properties of the films, as measured by VIS/UV spectroscopy, show particle size-dependent surface plasmon resonance effects. The nonlinear optical (NLO) properties of the nanoclusters in oxidized niobium were probed experimentally using degenerate four wave mixing (DFWM) and nonlinear transmission (NLT). The DFWM measurements yielded signals that showed strong evidence of saturation and give large values of χ(3)xxxxl. NLT measurements demonstrated that the nonlinear absorption coefficient and, hence, Imχ(3)xxxx was negative. Time resolved DFWM measurements exhibited dynamics that decayed on a several picosecond time scale. The magnitude and the picosecond dynamics of the NLO response were compared to those observed in gold nanoclusters formed by ion implantation in other media. The advantages of the IBAD method for fabricating third order NLO films include the ability to deposit films of arbitrary active region thicknesses and, more importantly, high cluster densities.

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