Pre-atomic layer deposition surface cleaning and chemical passivation of (100) In0.2Ga0.8As and deposition of ultrathin Al2O3 gate insulators

2008 ◽  
Vol 93 (5) ◽  
pp. 052911 ◽  
Author(s):  
Byungha Shin ◽  
Donghun Choi ◽  
James S. Harris ◽  
Paul C. McIntyre
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Surface Cleaning ◽  
Gate Insulators ◽  
Deposition Surface ◽  
Layer Deposition ◽  
Chemical Passivation

Chemical Passivation of Crystalline Si by Al2O3 Deposited Using Atomic Layer Deposition: Implications for Solar Cells

2021 ◽  
Author(s):  
Abigail R. Meyer ◽  
Rohan P. Chaukulkar ◽  
Noemi Leick ◽  
William Nemeth ◽  
David L. Young ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Chemical Passivation

Surface Passivation for Si Solar Cells: A Combination of Advanced Surface Cleaning and Thermal Atomic Layer Deposition of Al2O3

2012 ◽  
Vol 187 ◽  
pp. 357-361 ◽  
Author(s):  
Bart Vermang ◽  
Aude Rothschild ◽  
Karine Kenis ◽  
Kurt Wostyn ◽  
Twan Bearda ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Surface Cleaning ◽  
Hydrophilic Surface ◽  
Hot Air ◽  
Si Solar Cells ◽  
Layer Deposition ◽  
P Type

Thermal atomic layer deposition (ALD) of Al2O3 provides an adequate level of surface passivation for both p-type and n-type Si solar cells. To obtain the most qualitative and uniform surface passivation advanced cleaning development is required. The studied pre-deposition treatments include an HF (Si-H) or oxidizing (Si-OH) last step and finish with simple hot-air drying or more sophisticated Marangoni drying. To examine the quality and uniformity of surface passivation - after cleaning and Al2O3 deposition - carrier density imaging (CDI) and quasi-steady-state photo-conductance (QSSPC) are applied. A hydrophilic surface clean that leads to improved surface passivation level is found. Si-H starting surfaces lead to equivalent passivation quality but worse passivation uniformity. The hydrophilic surface clean is preferred because it is thermodynamically stable, enables higher and more uniform ALD growth and consequently exhibits better surface passivation uniformity.

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition
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