Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.44-46.135 ◽

1995 ◽

Vol 44-46 ◽

pp. 135-180 ◽

Cited By ~ 5

Author(s):

M. Zhang ◽

Yukihiro Nakayama

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Structural and electrical properties of thin microcrystalline silicon films deposited by an electron cyclotron resonance plasma discharge of 2% SiH4/Ar further diluted in H2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581481 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2751-2756 ◽

Cited By ~ 11

Author(s):

B. B. Jagannathan ◽

R. L. Wallace ◽

W. A. Anderson

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Structural And Electrical Properties ◽

Preparation and properties of amorphous silicon films produced using electron cyclotron resonance plasma

10.1063/1.41033 ◽

1991 ◽

Cited By ~ 2

Author(s):

Vikram L. Dalal ◽

Ralph D. Knox ◽

B. Moradi ◽

A. Beckel ◽

S. VanZante

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Silicon Films ◽

Effect of Microwave Pulse on the Deposition Rate of Hydrogenated Amorphous Silicon in the Electron Cyclotron Resonance Plasma Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l1191 ◽

1995 ◽

Vol 34 (Part 2, No. 9B) ◽

pp. L1191-L1193 ◽

Cited By ~ 5

Author(s):

Ju-Hyeon Lee ◽

Sang Kook Park ◽

Chang Sik Kim

Keyword(s):

Amorphous Silicon ◽

Deposition Rate ◽

Cyclotron Resonance ◽

Microwave Pulse ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

RF bias effects on properties of hydrogenated amorphous silicon deposited by electron cyclotron resonance plasma-enchanced chemical vapor deposition

10.1117/12.304500 ◽

1998 ◽

Author(s):

Yoshiyuki Hirano ◽

Fumio Sato ◽

Ahalapitiya H. Jayatissa ◽

Hiroshi Ohtake ◽

Kuniharu Takizawa

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Hydrogenated Amorphous ◽

Pressure dependent mode transition in an electron cyclotron resonance plasma discharge

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1387053 ◽

2001 ◽

Vol 19 (5) ◽

pp. 2446-2452 ◽

Cited By ~ 18

Author(s):

Ane Aanesland ◽

Åshild Fredriksen

Keyword(s):

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Mode Transition ◽

Ellipsometry investigation of nucleation and growth of electron cyclotron resonance plasma deposited silicon films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578479 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1686-1691 ◽

Cited By ~ 4

Author(s):

M. Li ◽

Y. Z. Hu ◽

J. Wall ◽

K. Conrad ◽

E. A. Irene

Keyword(s):

Cyclotron Resonance ◽

Nucleation And Growth ◽

Electron Cyclotron ◽

Silicon Films ◽

Pulse-Time Modulated Electron Cyclotron Resonance Plasma Discharge for Precise ULSI Patterning

10.7567/ssdm.1994.a-7-1 ◽

1994 ◽

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Pulse Time ◽

Dissociative Excitation of C2H2 in the Electron Cyclotron Resonance Plasma of Ar: Production of CH(A2Δ) Radicals and Formation of Hydrogenated Amorphous Carbon Films

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-012-9355-2 ◽

2012 ◽

Vol 32 (2) ◽

pp. 231-248 ◽

Cited By ~ 4

Author(s):

Haruhiko Ito ◽

Katsuaki Koshimura ◽

Saori Onitsuka ◽

Kohtaro Okada ◽

Tsuneo Suzuki ◽

...

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Dissociative Excitation ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Time-Modulated Electron Cyclotron Resonance Plasma Discharge for Controlling the Polymerization in SiO2Etching

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.6080 ◽

1993 ◽

Vol 32 (Part 1, No. 12B) ◽

pp. 6080-6087 ◽

Cited By ~ 28

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽