Structural and electrical properties of thin microcrystalline silicon films deposited by an electron cyclotron resonance plasma discharge of 2% SiH4/Ar further diluted in H2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581481 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2751-2756 ◽

Author(s):

B. B. Jagannathan ◽

R. L. Wallace ◽

W. A. Anderson

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Structural And Electrical Properties ◽

Resonance Plasma

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Preparation of doped hydrogenated amorphous silicon films by microwave electron‐cyclotron‐resonance plasma discharge deposition

Journal of Applied Physics ◽

10.1063/1.338013 ◽

1987 ◽

Vol 61 (5) ◽

pp. 2084-2087 ◽

Author(s):

M. Kitagawa ◽

K. Setsune ◽

Y. Manabe ◽

T. Hirao

Keyword(s):

Amorphous Silicon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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Effect of ion energy on structural and electrical properties of intrinsic microcrystalline silicon layer deposited in a matrix distributed electron cyclotron resonance plasma reactor

physica status solidi (a) ◽

10.1002/pssa.200982905 ◽

2010 ◽

Vol 207 (3) ◽

pp. 591-594 ◽

Author(s):

Sanjay K. Ram ◽

Laurent Kroely ◽

Pavel Bulkin ◽

Pere Roca i Cabarrocas

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Silicon Layer ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Structural And Electrical Properties ◽

Resonance Plasma

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Pressure dependent mode transition in an electron cyclotron resonance plasma discharge

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1387053 ◽

2001 ◽

Vol 19 (5) ◽

pp. 2446-2452 ◽

Author(s):

Ane Aanesland ◽

Åshild Fredriksen

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Mode Transition ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: effect of the oxygen to silane flow ratio

Semiconductor Science and Technology ◽

10.1088/0268-1242/11/3/023 ◽

1996 ◽

Vol 11 (3) ◽

pp. 422-426 ◽

Author(s):

M J Hernandez ◽

J Garrido ◽

J Martinez ◽

J Piqueras

Keyword(s):

Electrical Properties ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering

Applied Physics A ◽

10.1007/s00339-003-2483-z ◽

2004 ◽

Vol 80 (8) ◽

pp. 1781-1787 ◽

Author(s):

J. Wang ◽

L. Zhao ◽

N. H.Luu ◽

D. Wang ◽

H. Nakashima

Keyword(s):

Electrical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Gate Dielectrics ◽

Electron Cyclotron ◽

Plasma Sputtering ◽

High K ◽

Structural And Electrical Properties ◽

Resonance Plasma

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Effects of dc bias on the kinetics and electrical properties of silicon dioxide grown in an electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.349264 ◽

1991 ◽

Vol 70 (6) ◽

pp. 3301-3313 ◽

Author(s):

D. A. Carl ◽

D. W. Hess ◽

M. A. Lieberman ◽

T. D. Nguyen ◽

R. Gronsky

Keyword(s):

Electrical Properties ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Dc Bias ◽

Resonance Plasma

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Ellipsometry investigation of nucleation and growth of electron cyclotron resonance plasma deposited silicon films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578479 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1686-1691 ◽

Author(s):

M. Li ◽

Y. Z. Hu ◽

J. Wall ◽

K. Conrad ◽

E. A. Irene

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Nucleation And Growth ◽

Electron Cyclotron ◽

Silicon Films ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse-Time Modulated Electron Cyclotron Resonance Plasma Discharge for Precise ULSI Patterning

10.7567/ssdm.1994.a-7-1 ◽

1994 ◽

Author(s):

Seiji Samukawa

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Discharge ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electrical properties of GaAs selectively grown by electron cyclotron resonance plasma‐excited molecular beam epitaxy

Applied Physics Letters ◽

10.1063/1.105221 ◽

1991 ◽

Vol 58 (6) ◽

pp. 604-606 ◽

Author(s):

Norio Yamamoto ◽

Naoto Kondo ◽

Yasushi Nanishi

Keyword(s):

Electrical Properties ◽

Molecular Beam Epitaxy ◽

Cyclotron Resonance ◽

Molecular Beam ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Assessment of as-deposited microcrystalline silicon films on polymer substrates using electron cyclotron resonance-plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581715 ◽

1999 ◽

Vol 17 (4) ◽

pp. 1987-1990 ◽

Author(s):

Sanghoon Bae ◽

Stephen J. Fonash

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Microcrystalline Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Polymer Substrates ◽

Resonance Plasma

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