A simple technique for measuring the interface‐state density of the Schottky barrier diodes using the current‐voltage characteristics

1987 ◽  
Vol 61 (1) ◽  
pp. 299-304 ◽  
Author(s):  
Hsun‐Hua Tseng ◽  
Ching‐Yuan Wu
1993 ◽  
Vol 62 (20) ◽  
pp. 2560-2562 ◽  
Author(s):  
Keiji Maeda ◽  
Hideaki Ikoma ◽  
Kenji Sato ◽  
Toshiki Ishida

2007 ◽  
Vol 14 (04) ◽  
pp. 765-768 ◽  
Author(s):  
A. SELLAI ◽  
M. MAMOR ◽  
S. AL-HARTHI

Pd / Si 0.9 Ge 0.1/ Si Schottky barrier diodes subjected to irradiation are characterized using capacitance and conductance measurements performed under forward and reverse bias while varying the temperature and frequency. The C–V technique has been used in particular to determine the carriers profile as well as the interface state density and its energy distribution.


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