DENSITY OF SURFACE STATES IN Pd/SiGe/Si INTERFACE FROM CAPACITANCE MEASUREMENTS

2007 ◽  
Vol 14 (04) ◽  
pp. 765-768 ◽  
Author(s):  
A. SELLAI ◽  
M. MAMOR ◽  
S. AL-HARTHI

Pd / Si 0.9 Ge 0.1/ Si Schottky barrier diodes subjected to irradiation are characterized using capacitance and conductance measurements performed under forward and reverse bias while varying the temperature and frequency. The C–V technique has been used in particular to determine the carriers profile as well as the interface state density and its energy distribution.

2010 ◽  
Vol 12 (5) ◽  
pp. 706-711 ◽  
Author(s):  
Savaş Sönmezoğlu ◽  
Sevilay Şenkul ◽  
Recep Taş ◽  
Güven Çankaya ◽  
Muzaffer Can

2018 ◽  
Vol 924 ◽  
pp. 285-288 ◽  
Author(s):  
Patrick Fiorenza ◽  
Ferdinando Iucolano ◽  
Mario Saggio ◽  
Fabrizio Roccaforte

In this paper, near interface traps (NITs) in lateral 4H-SiC MOSFETs were investigated employing temperature dependent transient gate capacitance measurements (C-t). TheC-tmeasurements as a function of temperature indicated that the effective NITs discharge time is temperature independent and electrons from NITs are emitted toward the semiconductor via-tunnelling and/or trap-to-trap tunnelling. The NITs discharge time was modelled taking into account also the interface state density in a distributed circuit and it allowed to locate traps within a distance of about 1.3nm from the SiO2/4H-SiC interface.


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