Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon

Journal of Applied Physics ◽

10.1063/1.343278 ◽

1989 ◽

Vol 65 (11) ◽

pp. 4396-4402 ◽

Author(s):

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Catalytic chemical vapor deposition method to obtain high quality amorphous silicon and silicon-germanium

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(87)90330-9 ◽

1987 ◽

Vol 97-98 ◽

pp. 1379-1382 ◽

Author(s):

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Silicon Germanium ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

High Quality ◽

Catalytic Chemical Vapor Deposition

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Dominant parameter determining dangling-bond density in hydrogenated amorphous silicon films prepared by catalytic chemical vapor deposition

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00182-3 ◽

2001 ◽

Vol 66 (1-4) ◽

pp. 259-265 ◽

Author(s):

Atsushi Masuda ◽

Chisato Niikura ◽

Yoriko Ishibashi ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Dangling Bond ◽

Catalytic Chemical Vapor Deposition ◽

Bond Density ◽

Hydrogenated Amorphous ◽

Dominant Parameter

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Guiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus

Thin Solid Films ◽

10.1016/s0040-6090(01)01224-x ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 112-115 ◽

Author(s):

Atsushi Masuda ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Catalytic Chemical Vapor Deposition ◽

Guiding Principles ◽

Hydrogenated Amorphous

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Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.l168 ◽

2002 ◽

Vol 41 (Part 2, No. 2B) ◽

pp. L168-L170 ◽

Author(s):

Kazunori Koga ◽

Motohide Kai ◽

Masaharu Shiratani ◽

Yukio Watanabe ◽

Nobuhiro Shikatani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

High Quality ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Catalytic chemical vapor deposition method to prepare high quality hydro‐fluorinated amorphous silicon

Journal of Applied Physics ◽

10.1063/1.342069 ◽

1988 ◽

Vol 64 (11) ◽

pp. 6505-6509 ◽

Author(s):

Hideki Matsumura ◽

Hisanori Ihara

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

High Quality ◽

Catalytic Chemical Vapor Deposition

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Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.25.l949 ◽

1986 ◽

Vol 25 (Part 2, No. 12) ◽

pp. L949-L951 ◽

Author(s):

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

High Quality ◽

Catalytic Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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In situ optical diagnosis on hydrogenated amorphous silicon grown by vibration superimposed plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114284 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1071-1073 ◽

Author(s):

Nobuo Naito ◽

Akihiro Takano ◽

Masatomo Sumiya ◽

Masashi Kawasaki ◽

Hideomi Koinuma

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Optical Diagnosis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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X‐ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

Applied Physics Letters ◽

10.1063/1.107407 ◽

1992 ◽

Vol 60 (10) ◽

pp. 1208-1210 ◽

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Spectroscopy Analysis ◽

X Ray ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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Effect of Template on the Structure of Carbon Nanotubes Grown by Catalytic Chemical Vapor Deposition Method

Modern Chemistry & Applications ◽

10.4172/2329-6798.1000207 ◽

2017 ◽

Vol 05 (02) ◽

Author(s):

Hekmat F ◽

Sohrabi B ◽

Rahmanifar MS

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Structure Of Carbon Nanotubes

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