Guiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus

Thin Solid Films ◽

10.1016/s0040-6090(01)01224-x ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 112-115 ◽

Author(s):

Atsushi Masuda ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Catalytic Chemical Vapor Deposition ◽

Guiding Principles ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09573-9 ◽

1997 ◽

Vol 302 (1-2) ◽

pp. 17-24 ◽

Author(s):

Hae-Yeol Kim ◽

Ki-Young Lee ◽

Jai-Young Lee

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Dilution Ratio ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon

Journal of Applied Physics ◽

10.1063/1.343278 ◽

1989 ◽

Vol 65 (11) ◽

pp. 4396-4402 ◽

Author(s):

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Laser-Induced Chemical Vapor Deposition (LCVD) of Hydrogenated Amorphous Silicon Films

Laser/Optoelektronik in der Technik / Laser/Optoelectronics in Engineering ◽

10.1007/978-3-642-48372-1_152 ◽

1990 ◽

pp. 713-716

Author(s):

P. González ◽

M. D. Fernández ◽

B. León ◽

M. Pérez-Amor

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6196 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6196-6201 ◽

Author(s):

Sukti Hazra ◽

Mitsuyuki Yamanaka ◽

Isao Sakata ◽

Toshiyuki Tsutsumi ◽

Tatsuro Maeda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Thermal Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH4+B10H14Multi-Hollow Discharge Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.01ad03 ◽

2012 ◽

Vol 51 (1S) ◽

pp. 01AD03

Author(s):

Kazunori Koga ◽

Kenta Nakahara ◽

Yeon-Won Kim ◽

Takeaki Matsunaga ◽

Daisuke Yamashita ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Discharge Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Photo-chemical vapor deposition of hydrogenated amorphous silicon films

Applied Physics B Photophysics and Laser Chemistry ◽

10.1007/bf00702661 ◽

1986 ◽

Vol 41 (2) ◽

pp. 103-108 ◽

Author(s):

N. Mutsukura ◽

Y. Machi

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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Dominant parameter determining dangling-bond density in hydrogenated amorphous silicon films prepared by catalytic chemical vapor deposition

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(00)00182-3 ◽

2001 ◽

Vol 66 (1-4) ◽

pp. 259-265 ◽

Author(s):

Atsushi Masuda ◽

Chisato Niikura ◽

Yoriko Ishibashi ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Dangling Bond ◽

Catalytic Chemical Vapor Deposition ◽

Bond Density ◽

Hydrogenated Amorphous ◽

Dominant Parameter

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Properties of hydrogenated amorphous silicon films prepared by low‐frequency (50 Hz) plasma‐enhanced chemical‐vapor deposition

Journal of Applied Physics ◽

10.1063/1.352165 ◽

1992 ◽

Vol 72 (1) ◽

pp. 234-238 ◽

Author(s):

G. Tochitani ◽

M. Shimozuma ◽

H. Tagashira

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Low Frequency ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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Photoluminescence from nanocrystallites embedded in hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.111510 ◽

1994 ◽

Vol 64 (2) ◽

pp. 220-222 ◽

Author(s):

Xiang‐na Liu ◽

Xiao‐wei Wu ◽

Xi‐mao Bao ◽

Yu‐liang He

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous

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