A new sputtering‐type electron cyclotron resonance microwave plasma using an electric mirror and high‐rate deposition
1999 ◽
Vol 38
(Part 1, No. 7B)
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pp. 4393-4396
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1997 ◽
Vol 15
(3)
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pp. 647-653
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1988 ◽
Vol 27
(Part 2, No. 3)
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pp. L411-L413
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1992 ◽
Vol 10
(4)
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pp. 1295-1302
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1997 ◽
Vol 15
(6)
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pp. 1919
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