scholarly journals Hydrogenated amorphous carbon films deposited by low‐frequency plasma chemical vapor deposition at room temperature

1989 ◽  
Vol 66 (1) ◽  
pp. 447-449 ◽  
Author(s):  
M. Shimozuma ◽  
G. Tochitani ◽  
H. Ohno ◽  
H. Tagashira ◽  
J. Nakahara
Keyword(s):  
Vapor Deposition ◽  
Room Temperature ◽  
Low Frequency ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Frequency Plasma ◽  
Hydrogenated Amorphous

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

1991 ◽  
Vol 30 (Part 2, No. 5B) ◽  
pp. L924-L926 ◽  
Author(s):  
Masatoshi Nakayama ◽  
Kunihiro Ueda ◽  
Masanori Shibahara ◽  
Kazunori Maruyama ◽  
Kiichiro Kamata
Keyword(s):  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Rf Plasma ◽  
Photoelectron Emission ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Emission Study ◽  
Hydrogenated Amorphous

Boron-doped hydrogenated amorphous carbon films grown by surface-wave mode microwave plasma chemical vapor deposition

2006 ◽  
Vol 15 (11-12) ◽  
pp. 1909-1912 ◽  
Author(s):  
Sudip Adhikari ◽  
Dilip C. Ghimire ◽  
Hare Ram Aryal ◽  
Sunil Adhikary ◽  
Hideo Uchida ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Wave Mode ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Boron Doped ◽  
Hydrogenated Amorphous
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