Positive and negative direct current bias effects on the microstructures and physical properties of hydrogenated amorphous carbon films prepared by radio frequency plasma chemical vapor deposition

Direct Current Bias ◽

Frequency Plasma ◽

Hydrogenated amorphous carbon films deposited by low‐frequency plasma chemical vapor deposition at room temperature

Journal of Applied Physics ◽

10.1063/1.343846 ◽

1989 ◽

Vol 66 (1) ◽

pp. 447-449 ◽

Cited By ~ 10

Author(s):

M. Shimozuma ◽

G. Tochitani ◽

H. Ohno ◽

H. Tagashira ◽

J. Nakahara

Keyword(s):

Vapor Deposition ◽

Room Temperature ◽

Low Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Cited By ~ 15

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l924 ◽

1991 ◽

Vol 30 (Part 2, No. 5B) ◽

pp. L924-L926 ◽

Cited By ~ 3

Author(s):

Masatoshi Nakayama ◽

Kunihiro Ueda ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Rf Plasma ◽

Photoelectron Emission ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Emission Study ◽

Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1371268 ◽

2001 ◽

Vol 89 (12) ◽

pp. 7924-7931 ◽

Cited By ~ 44

Author(s):

Y. Hayashi ◽

G. Yu ◽

M. M. Rahman ◽

K. M. Krishna ◽

T. Soga ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Spectroscopic Properties ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Nitrogen Doped ◽

Frequency Plasma ◽

Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.136 ◽

2008 ◽

Vol 255 (5) ◽

pp. 1836-1840 ◽

Cited By ~ 6

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stress Relief ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Effects of flow ratios on surface morphology and structure of hydrogenated amorphous carbon films prepared by microwave plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.111 ◽

2009 ◽

Vol 255 (22) ◽

pp. 9058-9061 ◽

Cited By ~ 5

Author(s):

S.B. Yang ◽

F.M. Pan ◽

Y.E. Yang ◽

W.C. Zhang

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Morphology And Structure ◽

Stable hydrogenated amorphous silicon films deposited from silane and dichlorosilane by radio frequency plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.113612 ◽

1995 ◽

Vol 66 (8) ◽

pp. 965-967 ◽

Cited By ~ 12

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Frequency Plasma ◽

Influence of deposition pressure on hydrogenated amorphous carbon films prepared by d.c.-pulse plasma chemical vapor deposition

Surface and Interface Analysis ◽

10.1002/sia.5162 ◽

2012 ◽

Vol 45 (4) ◽

pp. 800-804 ◽

Cited By ~ 4

Author(s):

Chengbing Wang ◽

Jing Shi ◽

Rongbin Xia ◽

Zhongrong Geng

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Pressure ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1537717 ◽

2003 ◽

Vol 21 (2) ◽

pp. 515-517 ◽

Cited By ~ 13

Author(s):

Ayako Kimura ◽

Hideyuki Kodama ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Frequency Plasma

Gas barrier properties of hydrogenated amorphous carbon films coated on polymers by surface-wave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.11.152 ◽

2007 ◽

Vol 515 (7-8) ◽

pp. 3597-3601 ◽

Cited By ~ 17

Author(s):

Akihisa Ogino ◽

Masaaki Nagatsu

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Barrier Properties ◽

Carbon Films ◽

Plasma Chemical ◽

Gas Barrier ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Gas Barrier Properties