Preparation of hydrogenated amorphous carbon films using a microsecond-pulsed DC capacitive-coupled plasma chemical vapor deposition system operated at high frequency up to 400 kHz

Vapor Deposition ◽

High Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Pulsed Dc ◽

The correlation between pentatomic and heptatomic carbon rings and stress of hydrogenated amorphous carbon films prepared by dc-pulse plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.2996273 ◽

2008 ◽

Vol 93 (13) ◽

pp. 131920 ◽

Cited By ~ 15

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.136 ◽

2008 ◽

Vol 255 (5) ◽

pp. 1836-1840 ◽

Cited By ~ 6

Author(s):

Qi Wang ◽

Chengbing Wang ◽

Zhou Wang ◽

Junyan Zhang ◽

Deyan He

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Stress Relief ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Effects of flow ratios on surface morphology and structure of hydrogenated amorphous carbon films prepared by microwave plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2009.06.111 ◽

2009 ◽

Vol 255 (22) ◽

pp. 9058-9061 ◽

Cited By ~ 5

Author(s):

S.B. Yang ◽

F.M. Pan ◽

Y.E. Yang ◽

W.C. Zhang

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Morphology And Structure ◽

Influence of deposition pressure on hydrogenated amorphous carbon films prepared by d.c.-pulse plasma chemical vapor deposition

Surface and Interface Analysis ◽

10.1002/sia.5162 ◽

2012 ◽

Vol 45 (4) ◽

pp. 800-804 ◽

Cited By ~ 4

Author(s):

Chengbing Wang ◽

Jing Shi ◽

Rongbin Xia ◽

Zhongrong Geng

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Deposition Pressure ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2018.02.035 ◽

2018 ◽

Vol 660 ◽

pp. 891-898 ◽

Cited By ~ 2

Author(s):

Taojun Fang ◽

Kenji Yamaki ◽

Kazunori Koga ◽

Daisuke Yamashita ◽

Hyunwoong Seo ◽

...

Keyword(s):

Vapor Deposition ◽

Rate Ratio ◽

Chemical Vapor ◽

Carbon Films ◽

Flow Rate Ratio ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

High-density plasma chemical vapor deposition of amorphous carbon films

Diamond and Related Materials ◽

10.1016/s0925-9635(03)00371-6 ◽

2003 ◽

Author(s):

A Mousinho

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

High Density ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Density Plasma

Hydrogenated amorphous carbon films deposited by low‐frequency plasma chemical vapor deposition at room temperature

Journal of Applied Physics ◽

10.1063/1.343846 ◽

1989 ◽

Vol 66 (1) ◽

pp. 447-449 ◽

Cited By ~ 10

Author(s):

M. Shimozuma ◽

G. Tochitani ◽

H. Ohno ◽

H. Tagashira ◽

J. Nakahara

Keyword(s):

Vapor Deposition ◽

Room Temperature ◽

Low Frequency ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l924 ◽

1991 ◽

Vol 30 (Part 2, No. 5B) ◽

pp. L924-L926 ◽

Cited By ~ 3

Author(s):

Masatoshi Nakayama ◽

Kunihiro Ueda ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Rf Plasma ◽

Photoelectron Emission ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Emission Study ◽

Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1349720 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1577-1581 ◽

Cited By ~ 6

Author(s):

Haruhisa Kinoshita ◽

Masahiro Yoshida

Keyword(s):

Qualitative Analysis ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Plasma Chemical ◽

Electrically Conductive ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition

Positive and negative direct current bias effects on the microstructures and physical properties of hydrogenated amorphous carbon films prepared by radio frequency plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579398 ◽

1995 ◽

Vol 13 (2) ◽

pp. 195-199 ◽

Cited By ~ 15

Author(s):

Masatoshi Nakayama ◽

Atsuhiro Tsuyoshi ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Direct Current Bias ◽

Frequency Plasma ◽