The effect of the H2/(H2 + Ar) flow-rate ratio on hydrogenated amorphous carbon films grown using Ar/H2/C7H8 plasma chemical vapor deposition

2018 ◽  
Vol 660 ◽  
pp. 891-898 ◽  
Author(s):  
Taojun Fang ◽  
Kenji Yamaki ◽  
Kazunori Koga ◽  
Daisuke Yamashita ◽  
Hyunwoong Seo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Rate Ratio ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Flow Rate Ratio ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

1991 ◽  
Vol 30 (Part 2, No. 5B) ◽  
pp. L924-L926 ◽  
Author(s):  
Masatoshi Nakayama ◽  
Kunihiro Ueda ◽  
Masanori Shibahara ◽  
Kazunori Maruyama ◽  
Kiichiro Kamata
Keyword(s):  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Rf Plasma ◽  
Photoelectron Emission ◽  
Plasma Chemical ◽  
Amorphous Carbon Films ◽  
Plasma Chemical Vapor Deposition ◽  
Emission Study ◽  
Hydrogenated Amorphous
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