Monte Carlo determination of femtosecond dynamics of hot‐carrier relaxation and scattering processes in bulk GaAs

1990 ◽  
Vol 67 (12) ◽  
pp. 7399-7403 ◽  
Author(s):  
Xing Zhou ◽  
Thomas Y. Hsiang
1992 ◽  
Author(s):  
Wayne S. Pelouch ◽  
Randy J. Ellingson ◽  
Peter E. Powers ◽  
Chung L. Tang ◽  
Dean H. Levi ◽  
...  

1992 ◽  
Vol 7 (3B) ◽  
pp. B337-B339 ◽  
Author(s):  
W S Pelouch ◽  
R J Ellingson ◽  
P E Powers ◽  
C L Tang ◽  
D M Szmyd ◽  
...  

1992 ◽  
Vol 45 (3) ◽  
pp. 1450-1453 ◽  
Author(s):  
W. S. Pelouch ◽  
R. J. Ellingson ◽  
P. E. Powers ◽  
C. L. Tang ◽  
D. M. Szmyd ◽  
...  

Author(s):  
D. R. Liu ◽  
S. S. Shinozaki ◽  
R. J. Baird

The epitaxially grown (GaAs)Ge thin film has been arousing much interest because it is one of metastable alloys of III-V compound semiconductors with germanium and a possible candidate in optoelectronic applications. It is important to be able to accurately determine the composition of the film, particularly whether or not the GaAs component is in stoichiometry, but x-ray energy dispersive analysis (EDS) cannot meet this need. The thickness of the film is usually about 0.5-1.5 μm. If Kα peaks are used for quantification, the accelerating voltage must be more than 10 kV in order for these peaks to be excited. Under this voltage, the generation depth of x-ray photons approaches 1 μm, as evidenced by a Monte Carlo simulation and actual x-ray intensity measurement as discussed below. If a lower voltage is used to reduce the generation depth, their L peaks have to be used. But these L peaks actually are merged as one big hump simply because the atomic numbers of these three elements are relatively small and close together, and the EDS energy resolution is limited.


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