scholarly journals Plasma enhanced chemical vapor deposition and characterization of boron nitride gate insulators on InP

1991 ◽  
Vol 70 (8) ◽  
pp. 4366-4370 ◽  
Author(s):  
A. Bath ◽  
P. J. van der Put ◽  
J. G. M. Becht ◽  
J. Schoonman ◽  
B. Lepley
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Gate Insulators

ChemInform Abstract: Plasma-Assisted Chemical Vapor Deposition and Characterization of Boron Nitride Films.

ChemInform ◽  
2010 ◽  
Vol 25 (41) ◽  
pp. no-no
Author(s):  
S. V. NGUYEN ◽  
T. NGUYEN ◽  
H. TREICHEL ◽  
O. SPINDLER
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Boron Nitride Films

Plasma‐Assisted Chemical Vapor Deposition and Characterization of Boron Nitride Films

1994 ◽  
Vol 141 (6) ◽  
pp. 1633-1638 ◽  
Author(s):  
S. V. Nguyen ◽  
T. Nguyen ◽  
H. Treichel ◽  
O. Spindler
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Boron Nitride Films

Superior characteristics of graphene field effect transistor enclosed by chemical-vapor-deposition-grown hexagonal boron nitride

2014 ◽  
Vol 2 (37) ◽  
pp. 7776-7784 ◽  
Author(s):  
Muhammad Waqas Iqbal ◽  
Muhammad Zahir Iqbal ◽  
Xiaozhan Jin ◽  
Jonghwa Eom ◽  
Chanyong Hwang
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Graphene Field Effect Transistor ◽  
Effect Transistor ◽  
Grown Graphene ◽  
Graphene Devices

We report the characterization of high-quality chemical-vapor-deposition (CVD)-grown graphene devices on CVD-grown hexagonal boron nitride (h-BN).

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