Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

1991 ◽  
Vol 70 (12) ◽  
pp. 7374-7381 ◽  
Author(s):  
H. Kakinuma ◽  
M. Mohri ◽  
M. Sakamoto ◽  
T. Tsuruoka
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Structural Properties ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Polycrystalline Silicon Films

scholarly journals P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition

1995 ◽  
Vol 86 (1-4) ◽  
pp. 600-603 ◽  
Author(s):  
J. Puigdollers ◽  
J. Cifre ◽  
M.C. Polo ◽  
J.M. Asensi ◽  
J. Bertomeu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Polycrystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Hot Wire ◽  
Polycrystalline Silicon Films
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