Low Temperature Growth of Polycrystalline Silicon Films by Plasma Chemical Vapor Deposition under Higher Pressure than Atmospheric Pressure
1993 ◽
pp. 554-565
◽
2006 ◽
Vol 45
(4B)
◽
pp. 3581-3586
◽
2001 ◽
Vol 40
(Part 2, No. 11B)
◽
pp. L1207-L1210
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2017 ◽
Vol 309
◽
pp. 814-819
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1994 ◽
Vol 3
(4-6)
◽
pp. 443-447
◽
1997 ◽
Vol 177
(3-4)
◽
pp. 181-184
◽
2005 ◽
Vol 127
(36)
◽
pp. 12498-12499
◽
2008 ◽
Vol 8
(19)
◽
pp. 3523-3527
◽
1992 ◽
Vol 31
(Part 1, No. 5A)
◽
pp. 1428-1431
◽