Influence of H2/SiH4Ratio on the Deposition Rate and Morphology of Polycrystalline Silicon Films Deposited by Atmospheric Pressure Plasma Chemical Vapor Deposition
2006 ◽
Vol 45
(4B)
◽
pp. 3581-3586
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1993 ◽
pp. 554-565
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2006 ◽
Vol 45
(4B)
◽
pp. 3592-3597
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2013 ◽
Vol 31
(6)
◽
pp. 061508
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2007 ◽
Vol 46
(4B)
◽
pp. 2510-2515
◽
2006 ◽