Low‐pressure chemical vapor deposition of copper: Dependence of the selectivity on the water vapor added to a hydrogen or helium carrier gas

1992 ◽  
Vol 72 (5) ◽  
pp. 2022-2026 ◽  
Author(s):  
B. Lecohier ◽  
B. Calpini ◽  
J.‐M. Philippoz ◽  
H. van den Bergh
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Carrier Gas ◽  
Pressure Chemical

Selective low pressure chemical vapor deposition of copper: Effect of added water vapor in hydrogen or helium carrier gas

1992 ◽  
Vol 60 (25) ◽  
pp. 3114-3116 ◽  
Author(s):  
B. Lecohier ◽  
B. Calpini ◽  
J.‐M. Philippoz ◽  
T. Stumm ◽  
H. van den Bergh
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Carrier Gas ◽  
Pressure Chemical ◽  
Added Water ◽  
Copper Effect

Effect of water vapor on the growth of aluminum oxide films by low pressure chemical vapor deposition

1993 ◽  
Vol 230 (2) ◽  
pp. 156-159 ◽  
Author(s):  
J.S. Kim ◽  
H.A. Marzouk ◽  
P.J. Reucroft ◽  
J.D. Robertson ◽  
C.E. Hamrin
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Effect Of Water ◽  
Pressure Chemical

In Situ Phosphorus-Doped Poly-Si by Low Pressure Chemical Vapor Deposition for Passivating Contacts

2020 ◽  
Author(s):  
Meric Firat ◽  
Hariharsudan Sivaramakrishnan Radhakrishnan ◽  
Maria Recaman Payo ◽  
Filip Duerinckx ◽  
Rajiv Sharma ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical ◽  
Phosphorus Doped

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

2017 ◽  
Vol 19 (8) ◽  
pp. 1700193 ◽  
Author(s):  
Mattias Vervaele ◽  
Bert De Roo ◽  
Jolien Debehets ◽  
Marilyne Sousa ◽  
Luman Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Liquid Injection ◽  
Pressure Chemical ◽  
Direct Liquid Injection

Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane

1993 ◽  
Vol 5 (12) ◽  
pp. 1710-1714 ◽  
Author(s):  
R. A. Levy ◽  
J. M. Grow ◽  
G. S. Chakravarthy
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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