The effect of post deposition low energy plasma bombardment on the ultra thin hydrogenated silicon oxide films
Thickness-Dependent Interface Parameters of Silicon Oxide Films Grown on Plasma Hydrogenated Silicon
2010 ◽
Vol 159
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pp. 163-166
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1992 ◽
Vol 7
(8)
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pp. 1123-1126
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1997 ◽
Vol 127-128
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pp. 893-896
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Keyword(s):
2018 ◽
Vol 7
(3)
◽
pp. Q21-Q25
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