Comparison of electron cyclotron resonance and radio-frequency inductively coupled plasmas of Ar and N2: Neutral kinetic energies and source gas cracking

Electron Cyclotron ◽

Inductively Coupled ◽

International Conference on Plasma Science (papers in summary form only received) ◽

Comparison of quarter micron silicon dioxide profile control in electron-cyclotron-resonance and multidipole confined inductively coupled plasmas

10.1109/plasma.1995.531628 ◽

1995 ◽

Author(s):

Cheng Yang ◽

J.W. Taylor ◽

R.C. Woods ◽

J.A. Meyer

Keyword(s):

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Inductively Coupled ◽

Profile Control ◽

Mass spectrometric investigations on plasmas obtained from a dual electron cyclotron resonance-radio frequency discharge

Plasma Sources Science and Technology ◽

10.1088/0963-0252/7/4/018 ◽

1998 ◽

Vol 7 (4) ◽

pp. 607-616 ◽

Cited By ~ 28

Author(s):

M Zarrabian ◽

C Leteinturier ◽

G Turban

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Mass Spectrometric ◽

Electron Cyclotron ◽

Radio Frequency Discharge

Effectiveness of electron-cyclotron and transmission resonance heating in inductively coupled plasmas

Physics of Plasmas ◽

10.1063/1.2034407 ◽

2005 ◽

Vol 12 (10) ◽

pp. 104505 ◽

Cited By ~ 8

Author(s):

Oleg V. Polomarov ◽

Constantine E. Theodosiou ◽

Igor D. Kaganovich ◽

Badri N. Ramamurthi ◽

Demetre J. Economou

Keyword(s):

Electron Cyclotron ◽

Transmission Resonance ◽

Inductively Coupled ◽

Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

In situ deposition and etching process of a-C:H:N films in a dual electron cyclotron resonance–radio frequency plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00263-0 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 573-576 ◽

Cited By ~ 22

Author(s):

Junegie Hong ◽

Agnès Granier ◽

Antoine Goullet ◽

Guy Turban

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Etching Process ◽

Radio Frequency Plasma ◽

In Situ Deposition ◽

Frequency Plasma

Hybrid electron cyclotron resonance-radio-frequency plasma etching of III?V semiconductors in Cl2-based discharges. Part II: InP and related compounds

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447157 ◽

1991 ◽

Vol 11 (4) ◽

pp. 423-438 ◽

Cited By ~ 1

Author(s):

S. J. Pearton ◽

W. S. Hobson ◽

U. K. Chakrabarti ◽

A. Katz ◽

A. P. Perley

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Related Compounds

Effects of radio-frequency driving power, gas pressure, and nitrogen seeding on the transition dynamics in argon inductively coupled plasmas

Journal of Applied Physics ◽

10.1063/1.1790066 ◽

2004 ◽

Vol 96 (9) ◽

pp. 4771-4776 ◽

Cited By ~ 10

Author(s):

M. Abdur Razzak ◽

Shuichi Takamura ◽

Yoshihiko Uesugi

Keyword(s):

Radio Frequency ◽

Gas Pressure ◽

Transition Dynamics ◽

Inductively Coupled ◽

Effects of radio-frequency bias on silicon oxide films deposited by dual electron cyclotron resonance-radio frequency hybrid plasma

Acta Physica Sinica ◽

10.7498/aps.59.1338 ◽

2010 ◽

Vol 59 (2) ◽

pp. 1338

Author(s):

Ke Bo ◽

Wang Lei ◽

Ni Tian-Ling ◽

Ding Fang ◽

Chen Mu-Di ◽

...

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Oxide Films ◽

Electron Cyclotron ◽

Hybrid Plasma

Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias

Chinese Physics B ◽

10.1088/1674-1056/23/11/115202 ◽

2014 ◽

Vol 23 (11) ◽

pp. 115202 ◽

Cited By ~ 1

Author(s):

Fei Gao ◽

Yu-Ru Zhang ◽

Shu-Xia Zhao ◽

Xue-Chun Li ◽

You-Nian Wang

Keyword(s):

Radio Frequency ◽

Dynamic Behavior ◽

Inductively Coupled ◽

Modeling Injection of Dense Liquid Sprays in Radio Frequency Inductively Coupled Plasmas

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-004-3027-9 ◽

2005 ◽

Vol 25 (3) ◽

pp. 193-214 ◽

Cited By ~ 8

Author(s):

Yanguang Shan ◽

Javad Mostaghimi

Keyword(s):

Radio Frequency ◽

Inductively Coupled ◽

Liquid Sprays ◽

Coupled Plasmas ◽

Dense Liquid