Hybrid electron cyclotron resonance-radio-frequency plasma etching of III?V semiconductors in Cl2-based discharges. Part II: InP and related compounds

S. J. Pearton; W. S. Hobson; U. K. Chakrabarti; A. Katz; A. P. Perley

doi:10.1007/bf01447157

Hybrid electron cyclotron resonance-radio-frequency plasma etching of III?V semiconductors in Cl2-based discharges. Part II: InP and related compounds

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447157 ◽

1991 ◽

Vol 11 (4) ◽

pp. 423-438 ◽

Cited By ~ 1

Author(s):

S. J. Pearton ◽

W. S. Hobson ◽

U. K. Chakrabarti ◽

A. Katz ◽

A. P. Perley

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Related Compounds

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Hybrid electron cyclotron resonance-radio-frequency plasma etching of III?V semiconductors in Cl2-based discharges. Part I: GaAs and related compounds

Plasma Chemistry and Plasma Processing ◽

10.1007/bf01447156 ◽

1991 ◽

Vol 11 (4) ◽

pp. 405-422 ◽

Cited By ~ 9

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. Katz ◽

A. P. Perley ◽

W. S. Hobson ◽

...

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Related Compounds

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In situ deposition and etching process of a-C:H:N films in a dual electron cyclotron resonance–radio frequency plasma

Diamond and Related Materials ◽

10.1016/s0925-9635(99)00263-0 ◽

2000 ◽

Vol 9 (3-6) ◽

pp. 573-576 ◽

Cited By ~ 22

Author(s):

Junegie Hong ◽

Agnès Granier ◽

Antoine Goullet ◽

Guy Turban

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Etching Process ◽

Radio Frequency Plasma ◽

In Situ Deposition ◽

Frequency Plasma

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Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parameters

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1331295 ◽

2001 ◽

Vol 19 (1) ◽

pp. 9-16 ◽

Cited By ~ 7

Author(s):

A. Raveh ◽

J. Brewer ◽

E. A. Irene

Keyword(s):

Radio Frequency ◽

Process Parameters ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Resonance Effect ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Sio2 Films ◽

Frequency Plasma

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Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and composition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1333084 ◽

2001 ◽

Vol 19 (1) ◽

pp. 17-24 ◽

Cited By ~ 7

Author(s):

A. Raveh ◽

J. Brewer ◽

E. A. Irene

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Layer Structure ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Sio2 Films ◽

Frequency Plasma

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Deposition of amorphous nitrogenated carbon films using an alternate plasma deposition method in a dual electron cyclotron resonance-radio frequency plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581586 ◽

1999 ◽

Vol 17 (1) ◽

pp. 314-316 ◽

Cited By ~ 14

Author(s):

Junegie Hong ◽

Guy Turban

Keyword(s):

Radio Frequency ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Carbon Films ◽

Electron Cyclotron ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Frequency Plasma ◽

Nitrogenated Carbon

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Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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400 kHz radio-frequency biased electron cyclotron resonance plasma etching for Al–Si–Cu patterning

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585452 ◽

1991 ◽

Vol 9 (3) ◽

pp. 1471 ◽

Cited By ~ 4

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low radio frequency biased electron cyclotron resonance plasma etching

Applied Physics Letters ◽

10.1063/1.104469 ◽

1991 ◽

Vol 58 (9) ◽

pp. 896-898 ◽

Cited By ~ 7

Author(s):

Seiji Samukawa ◽

Tomohiko Toyosato ◽

Etsuo Wani

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

Applied Physics Letters ◽

10.1063/1.102487 ◽

1990 ◽

Vol 56 (15) ◽

pp. 1424-1426 ◽

Cited By ~ 52

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. P. Kinsella ◽

D. Johnson ◽

C. Constantine

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Diamond thin-film recessed gate field-effect transistors fabricated by electron cyclotron resonance plasma etching

IEEE Electron Device Letters ◽

10.1109/55.192795 ◽

1992 ◽

Vol 13 (9) ◽

pp. 462-464 ◽

Cited By ~ 36

Author(s):

S.A. Grot ◽

G.S. Gildenblat ◽

A.R. Badzian

Keyword(s):

Thin Film ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Field Effect ◽

Electron Cyclotron Resonance ◽

Field Effect Transistors ◽

Electron Cyclotron ◽

Diamond Thin Film ◽

Recessed Gate ◽

Resonance Plasma

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