scholarly journals Representation of GaP formation by a reduced order surface kinetics model using p-polarized reflectance measurements

1999 ◽  
Vol 86 (1) ◽  
pp. 674-682 ◽  
Author(s):  
S. Beeler ◽  
H. T. Tran ◽  
N. Dietz
Keyword(s):  
Kinetics Model ◽  
Gap Formation ◽  
Surface Kinetics ◽  
Reduced Order ◽  
Reflectance Measurements ◽  
Order Surface ◽  
Polarized Reflectance

Calculation of Spectral Optical Constants Using Combined Ellipsometric and Reflectance Methods for Smooth and Rough Bulk Samples

2021 ◽  
pp. 000370282110478
Author(s):  
Gilles Fortin
Keyword(s):  
Rough Surface ◽  
Optical Constants ◽  
Sample Surface ◽  
Infrared Region ◽  
Homogeneous Sample ◽  
Specular Reflectance ◽  
Scattering Effects ◽  
Spectral Ranges ◽  
Reflectance Measurements ◽  
Polarized Reflectance

Spectra of the optical constants n and k of a substance are often deduced from spectroscopic measurements, performed on a thick and homogeneous sample, and from a model used to simulate these measurements. Spectra obtained for n and k using the ellipsometric method generally produce polarized reflectance simulations in strong agreement with the experimental measurements, but they sometimes introduce significant discrepancies over limited spectral ranges, whereas spectra of n and k obtained with the single-angle reflectance method require a perfectly smooth sample surface to be viable. This paper presents an alternative method to calculate n and k. The method exploits both ellipsometric measurements and s-polarized specular reflectance measurements, and compensates for potential surface scattering effects with the introduction of a specularity factor. It is applicable to bulk samples having either a smooth or a rough surface. It provides spectral optical constants that are consistent with s-polarized reflectance measurements. Demonstrations are performed in the infrared region using a glass slide (smooth surface) and a pellet of compressed ammonium sulfate powder (rough surface).

scholarly journals Accuracy assessments of cloud droplet size retrievals from polarized reflectance measurements by the research scanning polarimeter

2012 ◽  
Vol 125 ◽  
pp. 92-111 ◽  
Author(s):  
Mikhail D. Alexandrov ◽  
Brian Cairns ◽  
Claudia Emde ◽  
Andrew S. Ackerman ◽  
Bastiaan van Diedenhoven
Keyword(s):  
Droplet Size ◽  
Cloud Droplet ◽  
Accuracy Assessments ◽  
Reflectance Measurements ◽  
Polarized Reflectance

A surface kinetics model for the growth of Si1−xGexfilms from SiH4/GeH4mixtures

1993 ◽  
Vol 73 (7) ◽  
pp. 3525-3530 ◽  
Author(s):  
N. M. Russell ◽  
W. G. Breiland
Keyword(s):  
Kinetics Model ◽  
Surface Kinetics

Optical constants of YBaCuO from polarized reflectance measurements

1994 ◽  
Vol 223 (1-2) ◽  
pp. 117-122 ◽  
Author(s):  
W. Markowitsch ◽  
W. Mayr ◽  
P. Schwab ◽  
X.Z. Wang
Keyword(s):  
Optical Constants ◽  
Reflectance Measurements ◽  
Polarized Reflectance

Polarized reflectance measurements of the CDW transitions inη−Mo4O11andγ−Mo4O11

1998 ◽  
Vol 58 (20) ◽  
pp. 13565-13573 ◽  
Author(s):  
A. W. McConnell ◽  
B. P. Clayman ◽  
C. C. Homes ◽  
M. Inoue ◽  
H. Negishi
Keyword(s):  
Reflectance Measurements ◽  
Polarized Reflectance

A surface kinetics model for the growth of Si1−xGex by UHV/CVD using SiH4/GeH4

2000 ◽  
Vol 218 (2-4) ◽  
pp. 245-249 ◽  
Author(s):  
Yu Zhuo ◽  
Li Daizong ◽  
Cheng Buwen ◽  
Huang Changjun ◽  
Lei Zhenlin ◽  
...  
Keyword(s):  
Kinetics Model ◽  
Surface Kinetics

A surface kinetics model for plasma etching

1980 ◽  
Author(s):  
L. Mei ◽  
S. Chen ◽  
R.W. Dutton
Keyword(s):  
Plasma Etching ◽  
Kinetics Model ◽  
Surface Kinetics

Surface Kinetics Model for SiLK Chemical Mechanical Polishing

2002 ◽  
Vol 149 (2) ◽  
pp. G118 ◽  
Author(s):  
Christopher L. Borst ◽  
Dipto G. Thakurta ◽  
William N. Gill ◽  
Ronald J. Gutmann
Keyword(s):  
Chemical Mechanical Polishing ◽  
Mechanical Polishing ◽  
Kinetics Model ◽  
Surface Kinetics

A Gas‐Phase and Surface Kinetics Model for Silicon Epitaxial Growth with SiH2Cl2 in an RTCVD Reactor

1995 ◽  
Vol 142 (1) ◽  
pp. 259-266 ◽  
Author(s):  
M. Hierlemann ◽  
A. Kersch ◽  
C. Werner ◽  
H. Schäfer
Keyword(s):  
Epitaxial Growth ◽  
Gas Phase ◽  
Kinetics Model ◽  
Surface Kinetics
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