Effect of oxygen stoichiometry on the insulator-metal phase transition in vanadium oxide thin films studied using optical pump-terahertz probe spectroscopy

2013 ◽  
Vol 103 (15) ◽  
pp. 151908 ◽  
Author(s):  
H. W. Liu ◽  
L. M. Wong ◽  
S. J. Wang ◽  
S. H. Tang ◽  
X. H. Zhang
2004 ◽  
Vol 30 (12) ◽  
pp. 948-955 ◽  
Author(s):  
P. Aleshkevych ◽  
M. Baran ◽  
R. Szymczak ◽  
H. Szymczak ◽  
V. A. Bedarev ◽  
...  

RSC Advances ◽  
2018 ◽  
Vol 8 (54) ◽  
pp. 30966-30977 ◽  
Author(s):  
Dipta Mukherjee ◽  
Arjun Dey ◽  
A. Carmel Mary Esther ◽  
N. Sridhara ◽  
D. Raghavendra Kumar ◽  
...  

Smooth, uniform mixed valance vanadium oxide (VO) thin films are grown on flexible, transparent Kapton and opaque Al6061 substrates by the spin coating technique at a constant rpm of 3000.


Author(s):  
В.В. Каминский ◽  
С.М. Соловьев ◽  
Г.Д. Хавров ◽  
Н.В. Шаренкова

AbstractThe influence of the Gd content on the semiconductor–metal phase transition in polycrystalline Sm_1– x Gd_ x S thin films produced by the flash evaporation of a powder in vacuum is studied. It is shown that the basic factor of the physical mechanism of the phase transition is compression of the film material. It is established that the films retain their semiconductor properties only up to a Gd content of x = 0.12.


Sign in / Sign up

Export Citation Format

Share Document