Synchrotron radiation photoemission study of interfacial electronic structure of HfO2 on In0.53Ga0.47As(001)-4 × 2 from atomic layer deposition

G. K. Wertheim

doi:10.1063/1.4863440

Synchrotron radiation photoemission study of interfacial electronic structure of HfO2 on In0.53Ga0.47As(001)-4 × 2 from atomic layer deposition

Applied Physics Letters ◽

10.1063/1.4863440 ◽

2014 ◽

Vol 104 (4) ◽

pp. 042904 ◽

Cited By ~ 9

Author(s):

G. K. Wertheim

Keyword(s):

Electronic Structure ◽

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Interfacial Electronic Structure ◽

Layer Deposition ◽

Photoemission Study ◽

Synchrotron Radiation Photoemission

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In situ atomic layer deposition and synchrotron-radiation photoemission study of Al2O3 on pristine n-GaAs(001)-4×6 surface

Microelectronic Engineering ◽

10.1016/j.mee.2011.03.064 ◽

2011 ◽

Vol 88 (7) ◽

pp. 1101-1104 ◽

Cited By ~ 15

Author(s):

Y.H. Chang ◽

M.L. Huang ◽

P. Chang ◽

J.Y. Shen ◽

B.R. Chen ◽

...

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Photoemission Study ◽

Synchrotron Radiation Photoemission

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Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study

Nanoscale Research Letters ◽

10.1186/1556-276x-8-169 ◽

2013 ◽

Vol 8 (1) ◽

Cited By ~ 8

Author(s):

Tun-Wen Pi ◽

Hsiao-Yu Lin ◽

Ya-Ting Liu ◽

Tsung-Da Lin ◽

Gunther K Wertheim ◽

...

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Photoemission Study ◽

Synchrotron Radiation Photoemission

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Interfacial electronic structure of magnesium deposited on Ag-covered tris(8-hydroxyquinolato) aluminum film: A synchrotron radiation photoemission study

Journal of Applied Physics ◽

10.1063/1.2511841 ◽

2007 ◽

Vol 101 (4) ◽

pp. 043704 ◽

Cited By ~ 4

Author(s):

Tun-Wen Pi ◽

Hsin-Han Lee ◽

Hsiao-Hsuan Lin ◽

J. Hwang

Keyword(s):

Electronic Structure ◽

Synchrotron Radiation ◽

Aluminum Film ◽

Interfacial Electronic Structure ◽

Photoemission Study ◽

Synchrotron Radiation Photoemission

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In-Situ Synchrotron Radiation Photoemission Spectroscopy Study of the Initial Atomic Layer Deposition of Al2O3 Film on Si(001) Substrate

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2011.3629 ◽

2011 ◽

Vol 11 (5) ◽

pp. 4328-4332 ◽

Cited By ~ 1

Author(s):

S. H. Kim ◽

B. K. Lee ◽

J. Baik ◽

C. Jeon ◽

S. S. Lee ◽

...

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition ◽

Synchrotron Radiation Photoemission

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The initial atomic layer deposition of HfO2∕Si(001) as followed in situ by synchrotron radiation photoelectron spectroscopy

Journal of Applied Physics ◽

10.1063/1.2978362 ◽

2008 ◽

Vol 104 (6) ◽

pp. 064116 ◽

Cited By ~ 26

Author(s):

Massimo Tallarida ◽

Konstantin Karavaev ◽

Dieter Schmeisser

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Photoelectron Spectroscopy ◽

Atomic Layer ◽

Layer Deposition

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Size Dependent Effects in Nucleation of Ru and Ru Oxide Thin Films by Atomic Layer Deposition Measured by Synchrotron Radiation X-ray Diffraction

Chemistry of Materials ◽

10.1021/cm401585k ◽

2013 ◽

Vol 25 (17) ◽

pp. 3458-3463 ◽

Cited By ~ 18

Author(s):

Rungthiwa Methaapanon ◽

Scott M. Geyer ◽

Sean Brennan ◽

Stacey F. Bent

Keyword(s):

Thin Films ◽

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

X Ray Diffraction ◽

Oxide Thin Films ◽

X Ray ◽

Size Dependent ◽

Layer Deposition

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Correlation of annealing effects on local electronic structure and macroscopic electrical properties for HfO2 deposited by atomic layer deposition

Applied Physics Letters ◽

10.1063/1.1626019 ◽

2003 ◽

Vol 83 (19) ◽

pp. 3984-3986 ◽

Cited By ~ 93

Author(s):

G. D. Wilk ◽

D. A. Muller

Keyword(s):

Electronic Structure ◽

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Layer Deposition ◽

Annealing Effects ◽

Local Electronic Structure

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Electronic structure investigation of atomic layer deposition ruthenium(oxide) thin films using photoemission spectroscopy

Journal of Applied Physics ◽

10.1063/1.4928462 ◽

2015 ◽

Vol 118 (6) ◽

pp. 065306 ◽

Cited By ~ 6

Author(s):

Michael Schaefer ◽

Rudy Schlaf

Keyword(s):

Thin Films ◽

Electronic Structure ◽

Atomic Layer Deposition ◽

Ruthenium Oxide ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Structure Investigation ◽

Oxide Thin Films ◽

Layer Deposition

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Interfacial electronic structure of Na deposited on rubrene thin film studied by synchrotron radiation photoemission

Applied Surface Science ◽

10.1016/j.apsusc.2015.09.221 ◽

2015 ◽

Vol 357 ◽

pp. 2255-2259 ◽

Cited By ~ 2

Author(s):

Ching-Hsuan Wei ◽

Chiu-Ping Cheng ◽

Hong-Cheu Lin ◽

Tun-Wen Pi

Keyword(s):

Thin Film ◽

Electronic Structure ◽

Synchrotron Radiation ◽

Interfacial Electronic Structure ◽

Synchrotron Radiation Photoemission

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Mixed Tin-Titanium Oxides by Atomic Layer Deposition on Planar Substrates: Physical and Electronic Structure

Applied Surface Science ◽

10.1016/j.apsusc.2021.151564 ◽

2021 ◽

pp. 151564

Author(s):

Michael J. Mortelliti ◽

Chiung-Wei Huang ◽

Joanna M. Atkin ◽

Jillian L. Dempsey

Keyword(s):

Electronic Structure ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Titanium Oxides ◽

Layer Deposition ◽

Planar Substrates

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