In-Situ Synchrotron Radiation Photoemission Spectroscopy Study of the Initial Atomic Layer Deposition of Al2O3 Film on Si(001) Substrate
2011 ◽
Vol 11
(5)
◽
pp. 4328-4332
◽
2018 ◽
Vol 36
(2)
◽
pp. 02D402
Keyword(s):
2011 ◽
Vol 88
(7)
◽
pp. 1101-1104
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In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2on Silicon Substrate
2012 ◽
Vol 51
(3R)
◽
pp. 031102
◽
2012 ◽
Vol 51
◽
pp. 031102
◽