Nonlinear shearing modes approach to the diocotron instability of a planar electron strip

2015 ◽  
Vol 22 (9) ◽  
pp. 092125 ◽  
Author(s):  
V. V. Mikhailenko ◽  
V. S. Mikhailenko ◽  
Younghyun Jo ◽  
Hae June Lee
2021 ◽  
Vol 11 (10) ◽  
pp. 4357
Author(s):  
Toby Nonnenmacher ◽  
Titus-Stefan Dascalu ◽  
Robert Bingham ◽  
Chung Lim Cheung ◽  
Hin-Tung Lau ◽  
...  

An electron plasma lens is a cost-effective, compact, strong-focusing element that can ensure efficient capture of low-energy proton and ion beams from laser-driven sources. A Gabor lens prototype was built for high electron density operation at Imperial College London. The parameters of the stable operation regime of the lens and its performance during a beam test with 1.4 MeV protons are reported here. Narrow pencil beams were imaged on a scintillator screen 67 cm downstream of the lens. The lens converted the pencil beams into rings that show position-dependent shape and intensity modulation that are dependent on the settings of the lens. Characterisation of the focusing effect suggests that the plasma column exhibited an off-axis rotation similar to the m=1 diocotron instability. The association of the instability with the cause of the rings was investigated using particle tracking simulations.


1994 ◽  
Vol 08 (11n12) ◽  
pp. 1625-1638 ◽  
Author(s):  
GERALD V. DUNNE

The N→∞ limit of the edges of finite planar electron densities is discussed for higher Landau levels. For full filling, the particle number is correlated with the magnetic flux, and hence with the boundary location, making the N→∞ limit more subtle at the edges than in the bulk. In the nth Landau level, the density exhibits n distinct steps at the edge, in both circular and rectangular samples. The boundary characteristics for individual Landau levels, and for successively filled Landau levels, are computed in an asymptotic expansion.


2013 ◽  
Vol 20 (4) ◽  
pp. 042101 ◽  
Author(s):  
V. V. Mikhailenko ◽  
Hae June Lee ◽  
V. S. Mikhailenko ◽  
N. A. Azarenkov

2006 ◽  
Vol 914 ◽  
Author(s):  
Hyo-Jong Lee ◽  
Heung Nam Han ◽  
Suk Hoon Kang ◽  
Jeong-Yun Sun ◽  
Kyu Hwan Oh

AbstractIn a crystallographic study of stress induced voiding of copper interconnect, the planar electron backscattered diffraction analysis showed that the void was initiated at the triple junction of the grain boundaries, not at the junction of the twin boundary and grain boundary. By using stepwise cross-sectional crystalline investigation for the void, it was possible to rebuild 3D crystalline structure near the void. From the stress calculation based on the measured crystalline structures, the hydrostatic stress was highly concentrated at the triple junction of the twin boundary and grain boundary, but experimentally, there was no voiding at that. The voiding in the copper interconnect may depend mainly on the boundary instability.


2014 ◽  
Vol 68 (9) ◽  
Author(s):  
Nicolas Crouseilles ◽  
Pierre Glanc ◽  
Sever A. Hirstoaga ◽  
Eric Madaule ◽  
Michel Mehrenberger ◽  
...  

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