scholarly journals Modeling of intense pulsed ion beam heated masked targets for extreme materials characterization

2017 ◽  
Vol 122 (19) ◽  
pp. 195901 ◽  
Author(s):  
John J. Barnard ◽  
Thomas Schenkel
Keyword(s):  
Ion Beam ◽  
Materials Characterization ◽  
Extreme Materials

Nanomechanical Characterization in the FIB

2005 ◽  
Author(s):  
Thomas M. Moore
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Materials Characterization ◽  
Depth Of Focus ◽  
Ion Milling ◽  
Nano Technology ◽  
Physical Behavior ◽  
Nanomechanical Testing ◽  
Load Cells ◽  
Scanning Electron

Abstract The availability of the focused ion beam (FIB) microscope with its excellent imaging resolution, depth of focus and ion milling capability has made it an appealing platform for materials characterization at the sub-micron, or "nano" level. This article focuses on nanomechanical characterization in the FIB, which is an extension of the FIB capabilities into the realm of nano-technology. It presents examples that demonstrate the power and flexibility of nanomechanical testing in the FIB or scanning electron microscope with a probe shaft that includes a built-in strain gauge. Loads that range from grams to micrograms are achievable. Calibration is limited only by the availability of calibrated load cells in the smallest load ranges. Deflections in the range of a few nanometers range can be accurately applied. Simultaneous electrical, mechanical, and visual data can be combined to provide a revealing study of physical behavior of complex and dynamic nanostructures.

Micromachining by Focused Ion Beam (FIB) for Materials Characterization

2005 ◽  
Vol 7 (5) ◽  
pp. 384-388 ◽  
Author(s):  
P. P. Jud ◽  
P. M. Nellen ◽  
U. Sennhauser
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Materials Characterization

Three-Dimensional Microstructural Characterization Using Focused Ion Beam Tomography

MRS Bulletin ◽  
2007 ◽  
Vol 32 (5) ◽  
pp. 408-416 ◽  
Author(s):  
Michael D. Uchic ◽  
Lorenz Holzer ◽  
Beverley J. Inkson ◽  
Edward L. Principe ◽  
Paul Munroe
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Microstructural Characterization ◽  
Materials Characterization ◽  
Experimental Methodology ◽  
Ion Milling ◽  
Current State ◽  
Recent Developments ◽  
Focused Ion Beam Tomography

AbstractThis article reviews recent developments and applications of focused ion beam (FIB) microscopes for three-dimensional (3D) materials characterization at the microscale through destructive serial sectioning experiments. Precise ion milling—in combination with electron-optic—based imaging and surface analysis methods—can be used to iteratively section through metals, ceramics, polymers, and electronic or biological materials to reveal the true size, shape, and distribution of microstructural features. Importantly, FIB tomographic experiments cover a critical size-scale gap that cannot be obtained with other instrumentation. The experiments encompass material volumes that are typically larger than 1000 μm3, with voxel dimensions approaching tens of nanometers, and can contain structural, chemical, and crystallographic information. This article describes the current state of the art of this experimental methodology and provides examples of specific applications to 3D materials characterization.

scholarly journals Focused ion beam and scanning electron microscopy for 3D materials characterization

MRS Bulletin ◽  
2014 ◽  
Vol 39 (4) ◽  
pp. 361-365 ◽  
Author(s):  
Paul G. Kotula ◽  
Gregory S. Rohrer ◽  
Michael P. Marsh
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Materials Characterization ◽  
Image Position ◽  
Scanning Electron

Abstract

Focused 0.5 MeV Ion Beam Line with Low Aberration Quadrupole Magnets

1989 ◽  
Vol 157 ◽  
Author(s):  
K. Inoue ◽  
M. Takai ◽  
K. Ishibashi ◽  
Y. Kawata ◽  
N. Suzuki ◽  
...  
Keyword(s):  
Ion Beam ◽  
Beam Line ◽  
Research Center ◽  
Extreme Materials

ABSTRACTA microbeam line with precisely designed quadrupole magnets has been developed and installed at the Research Center for Extreme Materials, Osaka University. For the purpose of applying the beam line to microbeam RBS/channeling, the damage in <100>Si due to the irradiation of probe beams was studied as a function of incident ion dose from 1015 to 1018 /cm2 with a flux of 8 × 104 nA/cm2. It was found that the dose for channeling measurements should be less than several 1017 /cm2.

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